Issued Patents All Time
Showing 1–15 of 15 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12073824 | Two-pass end to end speech recognition | Tara N. Sainath, Yanzhang He, Bo Li, Arun Narayanan, Ruoming Pang +2 more | 2024-08-27 |
| 11948062 | Compressed recurrent neural network models | Ouais Alsharif, Rohit Prakash Prabhavalkar, Ian C. McGraw | 2024-04-02 |
| 11942076 | Phoneme-based contextualization for cross-lingual speech recognition in end-to-end models | Ke Hu, Golan Pundak, Rohit Prakash Prabhavalkar, Tara N. Sainath | 2024-03-26 |
| 11664021 | Contextual biasing for speech recognition | Rohit Prakash Prabhavalkar, Golan Pundak, Tara N. Sainath | 2023-05-30 |
| 11270687 | Phoneme-based contextualization for cross-lingual speech recognition in end-to-end models | Ke Hu, Tara N. Sainath, Rohit Prakash Prabhavalkar, Golan Pundak | 2022-03-08 |
| 11217231 | Contextual biasing for speech recognition using grapheme and phoneme data | Rohit Prakash Prabhavalkar, Golan Pundak, Tara N. Sainath | 2022-01-04 |
| 10878319 | Compressed recurrent neural network models | Ouais Alsharif, Rohit Prakash Prabhavalkar, Ian C. McGraw | 2020-12-29 |
| 10484319 | Date and/or time resolution | Bryan Horling, Ashutosh Shukla | 2019-11-19 |
| 10277543 | Date and/or time resolution | Bryan Horling, Ashutosh Shukla | 2019-04-30 |
| 10152965 | Learning personalized entity pronunciations | Fuchun Peng, Francoise Beaufays | 2018-12-11 |
| 9588439 | Information matrix creation and calibration test pattern selection based on computational lithography model parameters | Yu Cao, Jun Ye, Wenjin Shao | 2017-03-07 |
| 8942463 | Harmonic resist model for use in a lithographic apparatus and a device manufacturing method | Yu Cao, Luoqi Chen, Wenjin Shao | 2015-01-27 |
| 8887105 | Calibration pattern selection based on noise sensitivity | Wenjin Shao, Song Lan | 2014-11-11 |
| 8682059 | Harmonic resist model for use in a lithographic apparatus and a device manufacturing method | Yu Cao, Luoqi Chen, Wenjin Shao | 2014-03-25 |
| 8447095 | Harmonic resist model for use in a lithographic apparatus and a device manufacturing method | Yu Cao, Luoqi Chen, Wenjin Shao | 2013-05-21 |