| 6537418 |
Spatially uniform gas supply and pump configuration for large wafer diameters |
K. Paul Muller, Bertrand Flietner |
2003-03-25 |
| 6294026 |
Distribution plate for a reaction chamber with multiple gas inlets and separate mass flow control loops |
Bernhard Poschenrieder, Karl Paul Muller |
2001-09-25 |
| 6190955 |
Fabrication of trench capacitors using disposable hard mask |
Matthias Ilg, Richard L. Kleinhenz, Soichi Nadahara, Ronald W. Nunes, Klaus Penner +2 more |
2001-02-20 |
| 6066570 |
Method and apparatus for preventing formation of black silicon on edges of wafers |
Dung-Ching Perng, David M. Dobuzinsky, Ting Wang |
2000-05-23 |
| 5776808 |
Pad stack with a poly SI etch stop for TEOS mask removal with RIE |
Karl Paul Muller, Bernhard Poschenrieder |
1998-07-07 |
| 5605600 |
Etch profile shaping through wafer temperature control |
Karl Paul Muller, Bernhard Poschenrieder, Toru Watanabe |
1997-02-25 |
| 5592412 |
Enhanced deep trench storage node capacitance for DRAM |
Richard L. Kleinhenz, Karl Paul Muller, Masakatsu Tuschiaki |
1997-01-07 |
