Issued Patents All Time
Showing 25 most recent of 31 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8828143 | Apparatus and method for the rapid thermal control of a work piece in liquid or supercritical fluid | John P. Simons, Kenneth McCullough, Wayne M. Moreau, John M. Cotte, Charles J. Taft +1 more | 2014-09-09 |
| 8388758 | Apparatus and method for the rapid thermal control of a work piece in liquid or supercritical fluid | John P. Simons, Kenneth McCullough, Wayne M. Moreau, John M. Cotte, Charles J. Taft +1 more | 2013-03-05 |
| 7332436 | Process of removing residue from a precision surface using liquid or supercritical carbon dioxide composition | John M. Cotte, Dario L. Goldfarb, Pamela Jones, Kenneth McCullough, Wayne M. Moreau +2 more | 2008-02-19 |
| 7288155 | Method for the rapid thermal control of a work piece in liquid or supercritical fluid | John P. Simons, Kenneth McCullough, Wayne M. Moreau, John M. Cotte, Charles J. Taft +1 more | 2007-10-30 |
| 7081208 | Method to build a microfilter | Kenneth McCullough, Wayne M. Moreau, Robert J. Purtell, John P. Simons, William A. Syverson +1 more | 2006-07-25 |
| 6997197 | Apparatus and method for rapid thermal control of a workpiece in liquid or dense phase fluid | John P. Simons, Kenneth McCullough, Wayne M. Moreau, John M. Cotte, Charles J. Taft +1 more | 2006-02-14 |
| 6927393 | Method of in situ monitoring of supercritical fluid process conditions | John M. Cotte, Kenneth McCullough, Wayne M. Moreau, Robert J. Purtell, John P. Simons +1 more | 2005-08-09 |
| 6890855 | Process of removing residue material from a precision surface | John M. Cotte, Kenneth McCullough, Wayne M. Moreau, John P. Simons, Charles J. Taft | 2005-05-10 |
| 6838015 | Liquid or supercritical carbon dioxide composition | John M. Cotte, Dario L. Goldfarb, Pamela Jones, Kenneth McCullough, Wayne M. Moreau +2 more | 2005-01-04 |
| 6823098 | Evanescent wave tunneling optical switch and network | Daniel Guidotti, Harold J. Hovel, Maurice McGlashan-Powell | 2004-11-23 |
| 6739346 | Apparatus for cleaning filters | John M. Cotte, Kenneth McCullough, Wayne M. Moreau, John P. Simons, Charles J. Taft | 2004-05-25 |
| 6736906 | Turbine part mount for supercritical fluid processor | John M. Cotte, Matteo Flotta, Kenneth McCullough, Wayne M. Moreau, John P. Simons +1 more | 2004-05-18 |
| 6683008 | Process of removing ion-implanted photoresist from a workpiece | John M. Cotte, Kenneth McCullough, Wayne M. Moreau, John P. Simons, Charles J. Taft | 2004-01-27 |
| 6653233 | Process of providing a semiconductor device with electrical interconnection capability | John M. Cotte, Kenneth McCullough, Wayne M. Moreau, John P. Simons, Charles J. Taft +1 more | 2003-11-25 |
| 6457480 | Process and apparatus for cleaning filters | John M. Cotte, Kenneth McCullough, Wayne M. Moreau, John P. Simons, Charles J. Taft | 2002-10-01 |
| 6454869 | Process of cleaning semiconductor processing, handling and manufacturing equipment | John M. Cotte, Dario L. Goldfarb, Kenneth McCullough, Wayne M. Moreau, John P. Simons +1 more | 2002-09-24 |
| 6398875 | Process of drying semiconductor wafers using liquid or supercritical carbon dioxide | John M. Cotte, Dario L. Goldfarb, Kenneth McCullough, Wayne M. Moreau, John P. Simons +1 more | 2002-06-04 |
| 6259712 | Interferometer method for providing stability of a laser | Donald M. DeCain, Philip Charles Danby Hobbs | 2001-07-10 |
| 6254796 | Selective etching of silicate | David L. Rath, Glenn W. Gale, Rangarajan Jagannathan, Kenneth McCullough, Karen P. Madden +1 more | 2001-07-03 |
| 6251787 | Elimination of photo-induced electrochemical dissolution in chemical mechanical polishing | Daniel C. Edelstein, Wilma Jean Horkans, Stephen E. Luce, Naftall E. Lustig, Peter D. Roper | 2001-06-26 |
| 6200891 | Removal of dielectric oxides | Rangarajan Jagannathan, Karen P. Madden, Kenneth McCullough, Harald Okorn-Schmidt, David L. Rath | 2001-03-13 |
| 6153043 | Elimination of photo-induced electrochemical dissolution in chemical mechanical polishing | Daniel C. Edelstein, Wilma Jean Horkans, Stephen E. Luce, Naftali E. Lustig, Peter D. Roper | 2000-11-28 |
| 6150282 | Selective removal of etching residues | David L. Rath, Rangarajan Jagannathan, Kenneth McCullough, Harald Okorn-Schmidt, Karen P. Madden | 2000-11-21 |
| 6117796 | Removal of silicon oxide | Glenn W. Gale, Rangarajan Jagannathan, Karen P. Madden, Kenneth McCullough, Harald Okorn-Schmidt +1 more | 2000-09-12 |
| 6066267 | Etching of silicon nitride | David L. Rath, Rangarajan Jagannathan, Kenneth McCullough, Harald Okorn-Schmidt, Karen P. Madden | 2000-05-23 |