Issued Patents All Time
Showing 1–19 of 19 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7334202 | Optimizing critical dimension uniformity utilizing a resist bake plate simulator | Bhanwar Singh, Qiaolin Zhang, Iraj Emami, Luigi Capodiece | 2008-02-19 |
| 7120514 | Method and apparatus for performing field-to-field compensation | Christopher A. Bode | 2006-10-10 |
| 7103439 | Method and apparatus for initializing tool controllers based on tool event data | Christopher A. Bode, Alexander J. Pasadyn, Anthony J. Toprac, Anastasia Oshelski Peterson, Thomas J. Sonderman +1 more | 2006-09-05 |
| 6969672 | Method and apparatus for controlling a thickness of a conductive layer in a semiconductor manufacturing operation | Alexander J. Pasadyn | 2005-11-29 |
| 6970757 | Method and apparatus for updating control state variables of a process control model based on rework data | Anthony J. Toprac, Christopher A. Bode, Alexander J. Pasadyn, Anastasia Oshelski Peterson, Thomas J. Sonderman +1 more | 2005-11-29 |
| 6937914 | Method and apparatus for controlling process target values based on manufacturing metrics | Christopher A. Bode, Thomas J. Sonderman, Alexander J. Pasadyn, Anthony J. Toprac, Anastasia Oshelski Peterson +1 more | 2005-08-30 |
| 6901340 | Method and apparatus for distinguishing between sources of process variation | Alexander J. Pasadyn, Christopher A. Bode, Anthony J. Toprac, Anastasia Oshelski Peterson, Thomas J. Sonderman +1 more | 2005-05-31 |
| 6801817 | Method and apparatus for integrating multiple process controllers | Christopher A. Bode, Alexander J. Pasadyn, Anthony J. Toprac, Anastasia Oshelski Peterson, Thomas J. Sonderman +1 more | 2004-10-05 |
| 6784001 | Automated variation of stepper exposure dose based upon across wafer variations in device characteristics, and system for accomplishing same | Anthony J. Toprac | 2004-08-31 |
| 6746958 | Method of controlling the duration of an endpoint polishing process in a multistage polishing process | Gerd Marxsen, Anthony J. Toprac | 2004-06-08 |
| 6699727 | Method for prioritizing production lots based on grade estimates and output requirements | Anthony J. Toprac, Christopher A. Bode, Alexander J. Pasadyn, Anastasia Oshelski Peterson, Thomas J. Sonderman +1 more | 2004-03-02 |
| 6664013 | Methods of characterizing device performance based upon the duration of an endpointed photoresist develop process, and system for accomplishing same | Christopher A. Bode | 2003-12-16 |
| 6632692 | Automated method of controlling critical dimensions of features by controlling stepper exposure dose, and system for accomplishing same | Alexander J. Pasadyn, Anthony J. Toprac | 2003-10-14 |
| 6595830 | Method of controlling chemical mechanical polishing operations to control erosion of insulating materials | Gerd Marxsen, Anthony J. Toprac | 2003-07-22 |
| 6588007 | Use of endpoint system to match individual processing stations within a tool | Alexander J. Pasadyn | 2003-07-01 |
| 6576385 | Method of varying stepper exposure dose to compensate for across-wafer variations in photoresist thickness | Christopher A. Bode, Alexander J. Pasadyn | 2003-06-10 |
| 6569692 | Automated method of controlling photoresist develop time to control critical dimensions, and system for accomplishing same | Christopher A. Bode | 2003-05-27 |
| 6534328 | Method of modeling and controlling the endpoint of chemical mechanical polishing operations performed on a process layer, and system for accomplishing same | Alexander J. Pasadyn | 2003-03-18 |
| 6365422 | Automated variation of stepper exposure dose based upon across wafer variations in device characteristics, and system for accomplishing same | Anthony J. Toprac | 2002-04-02 |