| 6849193 |
Highly selective process for etching oxide over nitride using hexafluorobutadiene |
Hoiman Hung, Hongqing Shan, Ruiping Wang, Gerald Yin |
2005-02-01 |
| 6797189 |
Enhancement of silicon oxide etch rate and nitride selectivity using hexafluorobutadiene or other heavy perfluorocarbon |
Hoiman Hung, Hongqing Shan, Michael R. Rice, Kenneth S. Collins, Chunshi Cui |
2004-09-28 |
| 6613691 |
Highly selective oxide etch process using hexafluorobutadiene |
Raymond Hung, Hongching Shan, Ruiping Wang, Gerald Yin |
2003-09-02 |
| 6602434 |
Process for etching oxide using hexafluorobutadiene or related fluorocarbons and manifesting a wide process window |
Hoiman Hung, Hongqing Shan, Ruiping Wang, Gerald Yin |
2003-08-05 |
| 6544429 |
Enhancement of silicon oxide etch rate and substrate selectivity with xenon addition |
Hoiman Hung, Hongchin Shan, Kenneth S. Collins, Chunshi Cui, Michael R. Rice |
2003-04-08 |
| 6387287 |
Process for etching oxide using a hexafluorobutadiene and manifesting a wide process window |
Hoiman Hung, Hongqing Shan, Ruiping Wang, Gerald Yin |
2002-05-14 |
| 6380096 |
In-situ integrated oxide etch process particularly useful for copper dual damascene |
Hoiman Hung, Sum-Yee Betty Tang, Jian Ding, Tianzong Xu |
2002-04-30 |
| 6329292 |
Integrated self aligned contact etch |
Raymond Hung, Jian Ding |
2001-12-11 |
| 6174451 |
Oxide etch process using hexafluorobutadiene and related unsaturated hydrofluorocarbons |
Raymond Hung, Hongching Shan, Ruiping Wang, Gerald Yin |
2001-01-16 |
| 5965035 |
Self aligned contact etch using difluoromethane and trifluoromethane |
Raymond Hung, Jian Ding, Gerald Yin |
1999-10-12 |
