| 6960499 |
Dual-counterdoped channel field effect transistor and method |
Mahalingam Nandakumar, Karthik Vasanth |
2005-11-01 |
| 6835622 |
Gate electrode doping method for forming semiconductor integrated circuit microelectronic fabrication with varying effective gate dielectric layer thicknesses |
Ling-Yen Yeh, Jyh-Chyurn Guo |
2004-12-28 |
| 6420236 |
Hydrogen treatment for threshold voltage shift of metal gate MOSFET devices |
Jerry Hu, Hong-Seon Yang, Amitava Chatterjee |
2002-07-16 |
| 6313010 |
Integrated circuit insulator and method |
Somnath Nag, Amitava Chatterjee |
2001-11-06 |
| 6306724 |
Method of forming a trench isolation structure in a stack trench capacitor fabrication process |
— |
2001-10-23 |
| 6287924 |
Integrated circuit and method |
Chih-Ping Chao, Rick L. Wise, Katherine E. Violette, Sreenath Unnikrishnan |
2001-09-11 |
| 6228725 |
Semiconductor devices with pocket implant and counter doping |
Mahalingam Nandakumar, Amitava Chatterjee, Mark S. Rodder |
2001-05-08 |
| 6147384 |
Method for forming planar field effect transistors with source and drain an insulator and device constructed therefrom |
— |
2000-11-14 |
| 6143625 |
Protective liner for isolation trench side walls and method |
Amitava Chatterjee, Somnath Nag |
2000-11-07 |
| 5917219 |
Semiconductor devices with pocket implant and counter doping |
Mahalingam Nandakumar, Amitava Chatterjee, Mark S. Rodder |
1999-06-29 |
| 5913135 |
Method for forming planar field effect transistors with source and drain on oxide and device constructed therefrom |
— |
1999-06-15 |
| 5909628 |
Reducing non-uniformity in a refill layer thickness for a semiconductor device |
Amitava Chatterjee, Theodore W. Houston, Agerico L. Esquirel, Somnath Nag, Iqbal Ali +4 more |
1999-06-01 |
| 5894145 |
Multiple substrate bias random access memory device |
Hisashi Shichijo, Clarence W. Teng |
1999-04-13 |
| 5739569 |
Non-volatile memory cell with oxide and nitride tunneling layers |
— |
1998-04-14 |
| 5595925 |
Method for fabricating a multiple well structure for providing multiple substrate bias for DRAM device formed therein |
Hisashi Shichijo, Clarence W. Teng |
1997-01-21 |
| 5548548 |
Pass transistor for a 256 megabit dram with negatively biased substrate |
Amitava Chatterjee, Jiann Liu, Purnendu K. Mozumder, Mark S. Rodder |
1996-08-20 |
| 5274261 |
Integrated circuit degradation resistant structure |
— |
1993-12-28 |
| 4888820 |
Stacked insulating film including yttrium oxide |
Bing W. Shen, James G. Bohlman, Hun-Lian Tsai |
1989-12-19 |
| 4882649 |
Nitride/oxide/nitride capacitor dielectric |
Bing W. Shen, Robert Reid Doering |
1989-11-21 |