GW

Gregory Michael Wallraff

IBM: 57 patents #1,416 of 70,183Top 3%
JS Jsr: 3 patents #346 of 1,137Top 35%
CL Central Glass Company, Limited: 2 patents #334 of 968Top 35%
Volkswagen: 1 patents #1,423 of 3,450Top 45%
Overall (All Time): #41,858 of 4,157,543Top 2%
58
Patents All Time

Issued Patents All Time

Showing 25 most recent of 58 patents

Patent #TitleCo-InventorsDate
10957953 Lithium oxygen battery and electrolyte composition Seok Ju Kang, Bryan D. McCloskey, Takashi Mori, Satoru Narizuka 2021-03-23
9772558 Sulfonic acid ester containing polymers for organic solvent based dual-tone photoresists Ramakrishnan Ayothi, Sally A. Swanson 2017-09-26
9666918 Lithium oxygen battery and electrolyte composition Seok Ju Kang, Bryan D. McCloskey, Takashi Mori, Satoru Narizuka 2017-05-30
9450278 Cathode material for lithium—oxygen battery Ho-Cheol Kim, Bryan D. McCloskey, Rouven Scheffler, Angela Speidel, Sally A. Swanson 2016-09-20
9057960 Resist performance for the negative tone develop organic development process Luisa D. Bozano, Dario L. Goldfarb, Linda Karin Sundberg, Hoa D. Truong, HsinYu Tsai 2015-06-16
8945808 Self-topcoating resist for photolithography Robert Allen David, Phillip Brock, Carl E. Larson, Daniel P. Sanders, Ratnam Sooriyakumaran +2 more 2015-02-03
8900802 Positive tone organic solvent developed chemically amplified resist Robert David Allen, Ramakrishnan Ayothi, Luisa D. Bozano, William D. Hinsberg, Linda Karin Sundberg +2 more 2014-12-02
8821978 Methods of directed self-assembly and layered structures formed therefrom Joy Cheng, William D. Hinsberg, Hiroshi Ito, Ho-Cheol Kim, Young-Hye Na +3 more 2014-09-02
8703386 Metal peroxo compounds with organic co-ligands for electron beam, deep UV and extreme UV photoresist applications John David Bass, Ho-Cheol Kim, Robert D. Miller, Qing Song, Linda Karin Sundberg 2014-04-22
8614047 Photodecomposable bases and photoresist compositions Ramakrishnan Ayothi, William D. Hinsberg, Sally A. Swanson 2013-12-24
8298751 Alkaline rinse agents for use in lithographic patterning William D. Hinsberg 2012-10-30
7951524 Self-topcoating photoresist for photolithography Robert David Allen, Phillip Brock, Shiro Kusumoto, Yukio Nishimura, Daniel P. Sanders +4 more 2011-05-31
7875408 Bleachable materials for lithography John A. Hoffnagle, David R. Medeiros, Robert D. Miller, Libor Vycklicky 2011-01-25
7855045 Immersion topcoat materials with improved performance Robert David Allen, Phillip Brock, Dario Gil, William D. Hinsberg, Carl E. Larson +1 more 2010-12-21
7820369 Method for patterning a low activation energy photoresist Robert David Allen, Gregory Breyta, Phillip Brock, Richard Anthony DiPietro, Ratnam Sooriyakumaran +1 more 2010-10-26
7807340 Photoresists for visible light imaging Gregory Breyta, Daniel J. Dawson, Carl E. Larson 2010-10-05
7767385 Method for lithography for optimizing process conditions Carl E. Larson, Sharee McNab, Steven E. Steen, Raman Viswanathan 2010-08-03
7651872 Discrete nano-textured structures in biomolecular arrays, and method of use Mark Whitney Hart, Ho-Cheol Kim, Robert D. Miller 2010-01-26
7585609 Bilayer film including an underlayer having vertical acid transport properties Carl E. Larson 2009-09-08
7354777 Discrete nano-textured structures in biomolecular arrays, and method of use Mark Whitney Hart, Ho-Cheol Kim, Robert D. Miller 2008-04-08
7354692 Photoresists for visible light imaging Gregory Breyta, Daniel J. Dawson, Carl E. Larson 2008-04-08
7300741 Advanced chemically amplified resist for sub 30 nm dense feature resolution Wu-Song Huang, David R. Medeiros 2007-11-27
7288362 Immersion topcoat materials with improved performance Robert David Allen, Phillip Brock, Dario Gil, William D. Hinsberg, Carl E. Larson +1 more 2007-10-30
7193023 Low activation energy photoresists Robert David Allen, Gregory Breyta, Phillip Brock, Richard Anthony DiPietro, Ratnam Sooriyakumaran +1 more 2007-03-20
7160665 Method for employing vertical acid transport for lithographic imaging applications Carl E. Larson 2007-01-09