| 6057080 |
Top antireflective coating film |
William R. Brunsvold, Christopher F. Lyons, Wayne M. Moreau, Robert L. Wood |
2000-05-02 |
| 5744537 |
Antireflective coating films |
William R. Brunsvold, Christopher F. Lyons, Wayne M. Moreau, Robert L. Wood |
1998-04-28 |
| 5733705 |
Acid Scavengers for use in chemically amplified photoresists |
Nageshwer Rao Bantu, William R. Brunsvold, Wu-Song Huang, Ahmad D. Katnani, Mahmoud M. Khofasteh +2 more |
1998-03-31 |
| 5667938 |
Acid scavengers for use in chemically amplified photoresists |
Nageshwer Rao Bantu, William R. Brunsvold, Wu-Song Huang, Ahmad D. Katnani, Mahmoud Khojasteh +2 more |
1997-09-16 |
| 5609989 |
Acid scavengers for use in chemically amplified photoresists |
Nageshwer Rao Bantu, William R. Brunsvold, Wu-Song Huang, Ahmad D. Katnani, Mahmoud Khojasteh +2 more |
1997-03-11 |
| 4939070 |
Thermally stable photoresists with high sensitivity |
William R. Brunsvold, Ming-Fea Chow, Willard E. Conley, Dale M. Crockatt, Jean M. J. Frechet +3 more |
1990-07-03 |
| 4908298 |
Method of creating patterned multilayer films for use in production of semiconductor circuits and systems |
Hiroshi Ito, Scott A. MacDonald, Carlton G. Willson |
1990-03-13 |
