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Process based metrology target design |
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2019-05-21 |
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Process based metrology target design |
Guangqing Chen, Shufeng Bai, Yen-Wen Lu, Paul Anthony Tuffy, Jen-Shiang Wang +3 more |
2018-06-26 |
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Method and apparatus for design of a metrology target |
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2017-10-31 |
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Method and apparatus for design of a metrology target |
Guangqing Chen, Jen-Shiang Wang, Omer Abubaker Omer Adam |
2016-05-31 |
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Stepper lens specific reticle compensation for critical dimension control |
— |
2003-03-04 |
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Exposure correction based on reflective index for photolithographic process control |
Jayendra D. Bhakta, Zicheng Gary Ling, Weizhong Wang, Warren T. Yu |
2002-11-19 |
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Apparatus for automatically cleaning resist nozzle |
Vincent L. Marinaro, Ted Wakamiya |
2002-07-16 |
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Dual track/stepper interface configuration for wafer processing |
Ted Wakamiya, Vince L. Marinaro |
2002-04-09 |
| 6361599 |
Mechanism for dispensing liquid onto an integrated circuit wafer with minimized back-splash |
Vincent L. Marinaro |
2002-03-26 |
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Dual resist dispense nozzle for wafer tracks |
Vince L. Marinaro, Ted Wakamiya |
2002-03-26 |
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System and method for purging air bubbles from filters |
Vince L. Marinaro, Ted Wakamiya |
2002-01-08 |
| 6318913 |
Semiconductor wafer manufacturing method and apparatus for an improved heat exchanger for a photoresist developer |
Ted Wakamiya, Vincent L. Marinaro |
2001-11-20 |
| 6299688 |
Developer nozzle clean combs |
Vincent L. Marinaro |
2001-10-09 |
| 6250822 |
Semiconductor wafer manufacturing method and apparatus for an improved heat exchanger for a photoresist developer |
Ted Wakamiya, Vincent L. Marinaro |
2001-06-26 |
| 6245584 |
Method for detecting adjustment error in photolithographic stepping printer |
Vincent L. Marinaro |
2001-06-12 |
| 6238747 |
Mechanism for dispensing liquid onto an integrated circuit wafer with minimized back-splash |
Vincent L. Marinaro |
2001-05-29 |
| 6170494 |
Method for automatically cleaning resist nozzle |
Vincent L. Marinaro, Ted Wakamiya |
2001-01-09 |
| 6130016 |
Method for forming semiconductor structures using a calibrating reticle |
— |
2000-10-10 |
| 6082379 |
Mechanism for cleaning an integrated circuit wafer hot plate while the hot plate is at operating temperature |
Vincent L. Marinaro |
2000-07-04 |
| 6051348 |
Method for detecting malfunction in photolithographic fabrication track |
Vincent L. Marinaro |
2000-04-18 |