Issued Patents All Time
Showing 25 most recent of 28 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9669000 | Pharmaceutical compositions comprising lignans and their derivatives for treating hyperplastic diseases | Hermann Stuppner, Stefan Schwaiger, Günther Laufer | 2017-06-06 |
| 9422513 | Metal and dielectric compatible sacrificial anti-reflective coating cleaning and removal composition | Melissa K. Rath, Thomas H. Baum, David W. Minsek | 2016-08-23 |
| 9256134 | Photoresist removal | David W. Minsek, Melissa K. Rath, Thomas H. Baum | 2016-02-09 |
| 9109188 | Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate | William A. Wojtczak, Ma. Fatima Seijo, Long Nguyen | 2015-08-18 |
| 8951948 | Metal and dielectric compatible sacrificial anti-reflective coating cleaning and removal composition | Melissa K. Rath, Thomas H. Baum, David W. Minsek | 2015-02-10 |
| 8765804 | Pharmaceutical compositions comprising lignans and their derivatives for treating hyperplastic diseases | Hermann Stuppner, Stefan Schwaiger, Günther Laufer | 2014-07-01 |
| 8679734 | Photoresist removal | David W. Minsek, Melissa K. Rath, Thomas H. Baum | 2014-03-25 |
| 8338087 | Composition and process for post-etch removal of photoresist and/or sacrificial anti-reflective material deposited on a substrate | Melissa K. Rath, David W. Minsek, Michael B. Korzenski, Thomas H. Baum | 2012-12-25 |
| 8293694 | Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate | William A. Wojtczak, Ma. Fatimo Seijo, Long Nguyen | 2012-10-23 |
| 8236485 | Photoresist removal | David W. Minsek, Melissa Murphy, Thomas H. Baum | 2012-08-07 |
| 8058219 | Metals compatible post-etch photoresist remover and/or sacrificial antireflective coating etchant | Melissa K. Rath, Thomas H. Baum, Ping Jiang, Renjie Zhou, Michael B. Korzenski | 2011-11-15 |
| 7994108 | Composition useful for removal of post-etch photoresist and bottom anti-reflection coatings | David W. Minsek, Weihua Wang, Thomas H. Baum, Melissa K. Rath | 2011-08-09 |
| 7888301 | Resist, barc and gap fill material stripping chemical and method | Yoichiro Fujita, Tomoe Miyazawa, Makoto Nakajima | 2011-02-15 |
| 7678393 | Mixture composition and method useful for topical and internal application | Bradford Ray Duncan | 2010-03-16 |
| 7662762 | Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrates | William A. Wojtczak, Ma. Fatima Seijo, Long Nguyen | 2010-02-16 |
| 7605113 | Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate | William A. Wojtczak, Ma. Fatima Seijo, Long Nguyen | 2009-10-20 |
| 7300601 | Passivative chemical mechanical polishing composition for copper film planarization | Jun Liu, Peter Wrschka, Mackenzie King, Michael S. Darsillo, Karl E. Boggs | 2007-11-27 |
| 7029373 | Chemical mechanical polishing compositions for metal and associated materials and method of using same | Ying Ma, William A. Wojtczak, Cary Regulski, Thomas H. Baum, Deepak Verma | 2006-04-18 |
| 6967169 | Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate | William A. Wojtczak, Ma. Fatima Seijo, Long Nguyen | 2005-11-22 |
| 6896826 | Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate | William A. Wojtczak, Ma. Fatima Seijo, Long Nguyen | 2005-05-24 |
| 6849200 | Composition and process for wet stripping removal of sacrificial anti-reflective material | Thomas H. Baum, David W. Minsek, Melissa Murphy | 2005-02-01 |
| 6800218 | Abrasive free formulations for chemical mechanical polishing of copper and associated materials and method of using same | Ying Ma, Michael Jones, Thomas H. Baum, Deepak Verma | 2004-10-05 |
| 6773873 | pH buffered compositions useful for cleaning residue from semiconductor substrates | Ma. Fatima Seijo, William A. Wojtczak, Thomas H. Baum, David W. Minsek | 2004-08-10 |
| 6755989 | Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate | William A. Wojtczak, Ma. Fatima Seijo, Long Nguyen | 2004-06-29 |
| 6692546 | Chemical mechanical polishing compositions for metal and associated materials and method of using same | Ying Ma, William A. Wojtczak, Cary Regulski, Thomas H. Baum, Deepak Verma | 2004-02-17 |