Issued Patents All Time
Showing 25 most recent of 44 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12233441 | Ultraviolet and ozone cleaning apparatus and method of using | Khalid Makhamreh, Eliyahu Shlomo DAGAN | 2025-02-25 |
| 12159782 | Ultraviolet and ozone clean system | Khalid Makhamreh, Hiroki Ogawa, Eliyahu Shlomo DAGAN | 2024-12-03 |
| 12128456 | Megasonic clean with cavity property monitoring | Khalid Makhamreh, Eliyahu Shlomo DAGAN | 2024-10-29 |
| 12085849 | Baking chamber with shroud for mask clean | Khalid Makhamreh, Eliyahu Shlomo DAGAN | 2024-09-10 |
| 11964068 | Atomic oxygen and ozone cleaning device having a temperature control apparatus | Eli DAGAN | 2024-04-23 |
| 11921422 | Single-volume baking chamber for mask clean | Khalid Makhamreh, Eliyahu Shlomo DAGAN | 2024-03-05 |
| 11908679 | Atomic oxygen and ozone device for cleaning and surface treatment | Eli DAGAN | 2024-02-20 |
| 11803118 | Methods and apparatus for photomask processing | Khalid Makhamreh, Eliyahu Shlomo DAGAN | 2023-10-31 |
| 11798799 | Ultraviolet and ozone clean system | Khalid Makhamreh, Hiroki Ogawa, Eliyahu Shlomo DAGAN | 2023-10-24 |
| 11654460 | Megasonic clean with cavity property monitoring | Khalid Makhamreh, Eliyahu Shlomo DAGAN | 2023-05-23 |
| 11644748 | Multi-volume baking chamber for mask clean | Khalid Makhamreh, Eliyahu Shlomo DAGAN | 2023-05-09 |
| 11467508 | Pellicle adhesive residue removal system and methods | Eli DAGAN | 2022-10-11 |
| 11209804 | Intelligent processing tools | — | 2021-12-28 |
| 11114350 | Method for removing photoresist from photomask substrate | Khalid Makhamreh, Eli DAGAN | 2021-09-07 |
| 11054746 | Portion of layer removal at substrate edge | Eli DAGAN | 2021-07-06 |
| 10962889 | Method and apparatus for high throughput photomask curing | Eli DAGAN, Khalid Makhamreh, Bruce J. Fender | 2021-03-30 |
| 10933624 | Photomask pellicle glue residue removal | Eli DAGAN | 2021-03-02 |
| 10928724 | Attachment feature removal from photomask in extreme ultraviolet lithography application | Eli DAGAN, Khalid Makhamreh, Bruce J. Fender | 2021-02-23 |
| 10802392 | Photomask laser etch | Eli DAGAN | 2020-10-13 |
| 10710358 | Photomask pellicle glue residue removal | Eli DAGAN | 2020-07-14 |
| 10236198 | Methods for the continuous processing of substrates | Nag B. Patibandla, Toshiaki Fujita, Ralf Hofmann, Pravin K. Narwankar, Jeonghoon Oh +2 more | 2019-03-19 |
| 10115572 | Methods for in-situ chamber clean in plasma etching processing chamber | Xiaoyi Chen, David Knick | 2018-10-30 |
| 9911582 | Methods and apparatus for controlling photoresist line width roughness with enhanced electron spin control | Ajay Kumar, Kartik Ramaswamy, Omkaram Nalamasu | 2018-03-06 |
| 9754765 | Electrodes for etch | Saravjeet Singh, Amitabh Sabharwal, Ajay Kumar | 2017-09-05 |
| 9748125 | Continuous substrate processing system | Nag B. Patibandla, Toshiaki Fujita, Ralf Hofmann, Pravin K. Narwankar, Jeonghoon Oh +2 more | 2017-08-29 |