Issued Patents All Time
Showing 1–10 of 10 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11964068 | Atomic oxygen and ozone cleaning device having a temperature control apparatus | Banqiu Wu | 2024-04-23 |
| 11908679 | Atomic oxygen and ozone device for cleaning and surface treatment | Banqiu Wu | 2024-02-20 |
| 11467508 | Pellicle adhesive residue removal system and methods | Banqiu Wu | 2022-10-11 |
| 11114350 | Method for removing photoresist from photomask substrate | Banqiu Wu, Khalid Makhamreh | 2021-09-07 |
| 11054746 | Portion of layer removal at substrate edge | Banqiu Wu | 2021-07-06 |
| 10962889 | Method and apparatus for high throughput photomask curing | Banqiu Wu, Khalid Makhamreh, Bruce J. Fender | 2021-03-30 |
| 10933624 | Photomask pellicle glue residue removal | Banqiu Wu | 2021-03-02 |
| 10928724 | Attachment feature removal from photomask in extreme ultraviolet lithography application | Banqiu Wu, Khalid Makhamreh, Bruce J. Fender | 2021-02-23 |
| 10802392 | Photomask laser etch | Banqiu Wu | 2020-10-13 |
| 10710358 | Photomask pellicle glue residue removal | Banqiu Wu | 2020-07-14 |