Issued Patents All Time
Showing 76–85 of 85 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7157374 | Method for removing a cap from the gate of an embedded silicon germanium semiconductor device | Andrew Waite | 2007-01-02 |
| 7071051 | Method for forming a thin, high quality buffer layer in a field effect transistor and related structure | Joong S. Jeon, Robert Clark-Phelps, Qi Xiang | 2006-07-04 |
| 7033894 | Method for modulating flatband voltage of devices having high-k gate dielectrics by post-deposition annealing | Joong S. Jeon | 2006-04-25 |
| 7022596 | Method for forming rectangular-shaped spacers for semiconductor devices | Srikanteswara Dakshina-Murthy | 2006-04-04 |
| 6992370 | Memory cell structure having nitride layer with reduced charge loss and method for fabricating same | George Jonathan Kluth, Robert Clark-Phelps, Joong S. Jeon, Arvind Halliyal, Mark T. Ramsbey +3 more | 2006-01-31 |
| 6991990 | Method for forming a field effect transistor having a high-k gate dielectric | Joong S. Jeon | 2006-01-31 |
| 6902977 | Method for forming polysilicon gate on high-k dielectric and related structure | George Jonathan Kluth, Joong S. Jeon, Qi Xiang | 2005-06-07 |
| 6872613 | Method for integrating metals having different work functions to form CMOS gates having a high-k gate dielectric and related structure | Qi Xiang, Jung-Suk Goo, Allison Holbrook, Joong S. Jeon, George Jonathan Kluth | 2005-03-29 |
| 6873020 | High/low work function metal alloys for integrated circuit electrodes | Veena Misra, ShinNam Hong | 2005-03-29 |
| 6797572 | Method for forming a field effect transistor having a high-k gate dielectric and related structure | Joong S. Jeon | 2004-09-28 |