AM

Andreas Meiser

Infineon Technologies Ag: 112 patents #14 of 7,486Top 1%
IA Infineon Technologies Austria Ag: 34 patents #24 of 1,126Top 3%
ID Infineon Technologies Dresden: 8 patents #14 of 150Top 10%
JA Jostra Ag: 1 patents #1 of 7Top 15%
Overall (All Time): #5,713 of 4,157,543Top 1%
156
Patents All Time

Issued Patents All Time

Showing 25 most recent of 156 patents

Patent #TitleCo-InventorsDate
12300724 Method of manufacturing silicon carbide semiconductor devices Caspar Leendertz, Anton Mauder, Roland Rupp 2025-05-13
12136670 Semiconductor device having contact trenches extending from opposite sides of a semiconductor body Markus Zundel, Hans-Peter Lang, Thorsten Meyer, Peter Irsigler 2024-11-05
11705506 Lateral trench transistor device Till Schloesser 2023-07-18
11600701 Semiconductor component having a SiC semiconductor body Caspar Leendertz, Anton Mauder 2023-03-07
11545545 Superjunction device with oxygen inserted Si-layers Martin Poelzl, Robert Haase, Sylvain Leomant, Maximilian Roesch, Ravi Keshav Joshi +2 more 2023-01-03
11245002 Superjunction transistor arrangement and method of producing thereof Rolf Weis, Henning Feick, Franz Hirler 2022-02-08
11217658 Semiconductor device with electrical resistor Grzegorz Kozlowski, Till Schloesser 2022-01-04
11195946 Method of manufacturing a silicon carbide semiconductor device with trench gate structure and vertical pn junction between body region and drift structure Romain Esteve, Roland Rupp 2021-12-07
11177354 Method of manufacturing silicon carbide semiconductor devices Caspar Leendertz, Anton Mauder, Roland Rupp 2021-11-16
11145745 Method for producing a semiconductor component Till Schloesser, Christian Kampen 2021-10-12
11121220 Semiconductor device including trench structures and manufacturing method Caspar Leendertz, Anton Mauder, Roland Rupp 2021-09-14
11069782 Semiconductor device comprising a gradually increasing field dielectric layer and method of manufacturing a semiconductor device Oliver Haeberlen 2021-07-20
11031466 Method of forming oxygen inserted Si-layers in power semiconductor devices Martin Poelzl, Robert Haase, Maximilian Roesch, Sylvain Leomant, Bernhard Goller +1 more 2021-06-08
11031494 Silicon carbide semiconductor device having a gate electrode formed in a trench structure 2021-06-08
11018244 Lateral trench transistor device Till Schloesser 2021-05-25
11011606 Semiconductor component having a SiC semiconductor body and method for producing a semiconductor component Caspar Leendertz, Anton Mauder 2021-05-18
10985248 SiC power semiconductor device with integrated Schottky junction Caspar Leendertz, Romain Esteve, Anton Mauder, Bernd Zippelius 2021-04-20
10985245 Semiconductor device with planar field effect transistor cell Christian Kampen 2021-04-20
10964808 Silicon carbide semiconductor device with trench gate structure and vertical PN junction between body region and drift structure Romain Esteve, Roland Rupp 2021-03-30
10903322 SiC power semiconductor device with integrated body diode Caspar Leendertz, Anton Mauder 2021-01-26
10903079 Method for forming complementary doped semiconductor regions in a semiconductor body Rolf Weis, Thomas R. Gross, Hermann Gruber, Franz Hirler, Markus Rochel +2 more 2021-01-26
10868146 Method for producing a semiconductor device having a superjunction structure, first and second trenches and a trench structure in the second trench Till Schloesser 2020-12-15
10868172 Vertical power devices with oxygen inserted Si-layers Oliver Blank, Thomas Feil, Maximilian Roesch, Martin Poelzl, Robert Haase +2 more 2020-12-15
10845428 Method and circuit for detecting a loss of a bondwire in a power switch Benno Koeppl, Marcus Nuebling, Markus Zannoth, Alexander Mayer 2020-11-24
10790353 Semiconductor device with superjunction and oxygen inserted Si-layers Martin Poelzl, Robert Haase, Sylvain Leomant, Maximilian Roesch, Ravi Keshav Joshi +2 more 2020-09-29