MH

Mark C. Hakey

IBM: 224 patents #130 of 70,183Top 1%
Globalfoundries: 1 patents #2,221 of 4,424Top 55%
📍 Colchester, VT: #1 of 432 inventorsTop 1%
🗺 Vermont: #12 of 4,968 inventorsTop 1%
Overall (All Time): #2,491 of 4,157,543Top 1%
228
Patents All Time

Issued Patents All Time

Showing 76–100 of 228 patents

Patent #TitleCo-InventorsDate
7381610 Semiconductor transistors with contact holes close to gates Toshiharu Furukawa, Steven J. Holmes, David V. Horak, Charles W. Koburger, III, William R. Tonti 2008-06-03
7378678 Memory device and method of manufacturing the device by simultaneously conditioning transition metal oxide layers in a plurality of memory cells Toshijaru Furukawa, Steven J. Holmes, David V. Horak, Charles W. Koburger, III, Chung H. Lam +1 more 2008-05-27
7374793 Methods and structures for promoting stable synthesis of carbon nanotubes Toshiharu Furukawa, Steven J. Holmes, David Vaclav Hotak, Charles W. Koburger, III, Peter H. Mitchell +1 more 2008-05-20
7368712 Y-shaped carbon nanotubes as AFM probe for analyzing substrates with angled topography Carol Boye, Toshiharu Furukawa, Steven J. Holmes, David V. Horak, Charles W. Koburger, III 2008-05-06
7362412 Method and apparatus for cleaning a semiconductor substrate in an immersion lithography system Steven J. Holmes, Toshiharu Furukawa, David V. Horak 2008-04-22
7358140 Pattern density control using edge printing processes Toshiharu Furukawa, Steven J. Holmes, David V. Horak, Charles W. Koburger, III 2008-04-15
7358120 Silicon-on-insulator (SOI) read only memory (ROM) array and method of making a SOI ROM Toshiharu Furukawa, Steven J. Holmes, David V. Horak, Charles W. Koburger, III, Jack A. Mandelman 2008-04-15
7352607 Non-volatile switching and memory devices using vertical nanotubes Toshiharu Furukawa, Steven J. Holmes, David V. Horak, Charles W. Koburger, III 2008-04-01
7352030 Semiconductor devices with buried isolation regions Toshiharu Furukawa, Steven J. Holmes, David V. Horak, Charles W. Koburger, III 2008-04-01
7351666 Layout and process to contact sub-lithographic structures Toshiharu Furukawa, Steven J. Holmes, David V. Horak, Charles W. Koburger, III, Chung H. Lam 2008-04-01
7351648 Methods for forming uniform lithographic features Toshiharu Furukawa, Steven J. Holmes, David V. Horak, Charles W. Koburger, III, Chung H. Lam 2008-04-01
7348634 Shallow trench isolation formation Toshiharu Furukawa, Steven J. Holmes, David V. Horak, Charles W. Koburger, III 2008-03-25
7345370 Wiring patterns formed by selective metal plating Toshiharu Furukawa, Steven J. Holmes, David V. Horak, Charles W. Koburger, III 2008-03-18
7329567 Vertical field effect transistors incorporating semiconducting nanotubes grown in a spacer-defined passage Toshiharu Furukawa, Steven J. Holmes, David V. Horak, Peter H. Mitchell, Larry Nesbit 2008-02-12
7329602 Wiring structure for integrated circuit with reduced intralevel capacitance Richard S. Wise, Bomy Chen, Hongwen Yan 2008-02-12
7317226 Patterned SOI by oxygen implantation and annealing Keith E. Fogel, Steven J. Holmes, Devendra K. Sadana, Ghavam G. Shahidi 2008-01-08
7282423 Method of forming fet with T-shaped gate Toshiharu Furukawa, Steven J. Holmes, David V. Horak, Edward J. Nowak 2007-10-16
7273794 Shallow trench isolation fill by liquid phase deposition of SiO2 Steven J. Holmes, David V. Horak, Charles W. Koburger, III, Peter H. Mitchell, Larry Nesbit 2007-09-25
7271444 Wrap-around gate field effect transistor Toshiharu Furukawa, David V. Horak, Charles W. Koburger, III, Peter H. Mitchell 2007-09-18
7271079 Method of doping a gate electrode of a field effect transistor Toshiharu Furukawa, Steven J. Holmes, David V. Horak, Charles W. Koburger, III 2007-09-18
7271878 Wafer cell for immersion lithography Toshiharu Furukawa, David Vaclav Horal, Charles W. Koburger, III, Peter H. Mitchell 2007-09-18
7268028 Well isolation trenches (WIT) for CMOS devices Toshiharu Furukawa, David V. Horak, Charles W. Koburger, III, Jack A. Mandelman, William R. Tonti 2007-09-11
7265013 Sidewall image transfer (SIT) technologies Toshiharu Furukawa, Steven J. Holmes, David V. Horak, Charles W. Koburger, III, Kirk D. Peterson 2007-09-04
7264415 Methods of forming alternating phase shift masks having improved phase-shift tolerance Toshiharu Furukawa, Steven J. Holmes, David V. Horak, Charles W. Koburger, III, Peter H. Mitchell +1 more 2007-09-04
7256114 Process for oxide cap formation in semiconductor manufacturing Steven J. Holmes, Toshiharu Furukawa, David V. Horak, Charles W. Koburger, III, Larry Nesbit 2007-08-14