Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
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David C. Strippe — 12 Patents

IBM: 11 patents #10,022 of 70,183Top 15%
Siemens Aktiengesellschaft: 1 patents #10,653 of 22,248Top 50%
Waterbury Center, VT: #3 of 17 inventorsTop 20%
Vermont: #621 of 4,968 inventorsTop 15%
Overall (All Time): #396,045 of 4,157,543Top 10%
12 Patents All Time
David C. Strippe has been granted 12 US patents while listed as an inventor at IBM. The first was granted in 1988 and the most recent in March 2015. David C. Strippe ranks #396,045 of 4,157,543 US inventors in our database (top 9.5%). Patent records list David C. Strippe in Waterbury Center, VT, US.

Patents per Year

Patents granted per year, 1988 to 2015Bar chart with a peak of 2 patents in 2001.peak 21988: 1 patents19881989: 1 patents1995: 1 patents19951996: 1 patents1997: 1 patents19972001: 2 patents2005: 1 patents20052009: 1 patents2011: 1 patents20112012: 1 patents2015: 1 patents2015

Issued Patents All Time

Showing 1–12 of 12 patents

Patent #TitleCo-InventorsDateApprox Value ⓘ
8969195 Methods of manufacturing semiconductor devices and a semiconductor structure Felix P. Anderson, Steven P. Barkyoumb, Edward C. Cooney, III, Thomas L. McDevitt, William J. Murphy 2015-03-03 $3,627,000
8157970 Sputtering target fixture William J. Murphy 2012-04-17 $5,847,000
8052799 By-product collecting processes for cleaning processes Edward C. Cooney, III, William J. Murphy, Anthony K. Stamper 2011-11-08 $3,097,000
7485210 Sputtering target fixture William J. Murphy 2009-02-03 $3,057,000
6838364 Sputtered tungsten diffusion barrier for improved interconnect robustness Stephen Bruce Brodsky, William J. Murphy, Matthew J. Rutten, Daniel S. Vanslette 2005-01-04 $10,543,000
6245668 Sputtered tungsten diffusion barrier for improved interconnect robustness Stephen Bruce Brodsky, William J. Murphy, Matthew J. Rutten, Daniel S. Vanslette 2001-06-12 $30,235,000
6210541 Process and apparatus for cold copper deposition to enhance copper plating fill Edward C. Cooney, III, Josef W. Korejwa 2001-04-03 $36,356,000
5628889 High power capacity magnetron cathode David L. Gardell 1997-05-13 $10,594,000
5529670 Method of depositing conductors in high aspect ratio apertures under high temperature conditions James G. Ryan, Bernd Vollmer 1996-06-25 $5,688,000
5401675 Method of depositing conductors in high aspect ratio apertures using a collimator Pei-Ing Lee, Thomas J. Licata, Thomas L. McDevitt, Paul C. Parries, Scott L. Pennington +1 more 1995-03-28
4876114 Process for the self fractionation deposition of a metallic layer on a workpiece Richard R. Phinney 1989-10-24 $23,575,000
4791261 Crucible for evaporation of metallic film Richard R. Phinney 1988-12-13 $20,757,000