AR

Alexander Reznicek

IBM: 1182 patents #3 of 70,183Top 1%
Globalfoundries: 77 patents #21 of 4,424Top 1%
ET Elpis Technologies: 9 patents #2 of 121Top 2%
GU Globalfoundries U.S.: 4 patents #206 of 665Top 35%
Samsung: 3 patents #30,683 of 75,807Top 45%
TE Tessera: 3 patents #129 of 271Top 50%
SS Stmicroelectronics Sa: 2 patents #601 of 1,676Top 40%
MT Matheson Tri-Gas: 1 patents #28 of 47Top 60%
IB International Business: 1 patents #4 of 119Top 4%
IM International Machines: 1 patents #1 of 34Top 3%
AS Adeia Semiconductor Solutions: 1 patents #22 of 57Top 40%
RE Renesas Electronics: 1 patents #2,739 of 4,529Top 65%
📍 Troy, NY: #1 of 610 inventorsTop 1%
🗺 New York: #2 of 115,490 inventorsTop 1%
Overall (All Time): #40 of 4,157,543Top 1%
1279
Patents All Time

Issued Patents All Time

Showing 1,026–1,050 of 1,279 patents

Patent #TitleCo-InventorsDate
9443853 Minimizing shorting between FinFET epitaxial regions Kangguo Cheng, Balasubramanian Pranatharthiharan, Charan V. Surisetty 2016-09-13
9443940 Defect reduction with rotated double aspect ratio trapping Keith E. Fogel, Judson R. Holt, Pranita Kerber 2016-09-13
9437675 eDRAM for planar III-V semiconductor devices Kangguo Cheng, Bruce B. Doris, Ali Khakifirooz 2016-09-06
9437427 Controlled confined lateral III-V epitaxy Karthik Balakrishnan, Lukas Czornomaz, Pouya Hashemi 2016-09-06
9437502 Method to form stacked germanium nanowires and stacked III-V nanowires Kangguo Cheng, Pouya Hashemi, Ali Khakifirooz 2016-09-06
9437679 Semi-conductor device with epitaxial source/drain facetting provided at the gate edge Thomas N. Adam, Kangguo Cheng, Bruce B. Doris, Ali Khakifirooz 2016-09-06
9437714 Selective gate contact fill metallization Praneet Adusumilli, Oscar van der Straten, Chih-Chao Yang 2016-09-06
9431265 Fin cut for tight fin pitch by two different sit hard mask materials on fin Kangguo Cheng, Ali Khakifirooz, Tenko Yamashita 2016-08-30
9425291 Stacked nanosheets by aspect ratio trapping Karthik Balakrishnan, Kangguo Cheng, Pouya Hashemi 2016-08-23
9425293 Stacked nanowires with multi-threshold voltage solution for pFETs Karthik Balakrishnan, Kangguo Cheng, Pouya Hashemi 2016-08-23
9419078 Floating body memory with asymmetric channel Kangguo Cheng, Bruce B. Doris, Ali Khakifirooz 2016-08-16
9418841 Type III-V and type IV semiconductor device formation Kangguo Cheng, Bruce B. Doris, Pouya Hashemi, Ali Khakifirooz 2016-08-16
9419074 Non-planar semiconductor device with aspect ratio trapping Kangguo Cheng, Pouya Hashemi, Ali Khakifirooz 2016-08-16
9419138 Embedded carbon-doped germanium as stressor for germanium nFET devices Jeffrey L. Dittmar, Keith E. Fogel, Sebastian Naczas, Devendra K. Sadana 2016-08-16
9419079 Low defect relaxed SiGe/strained Si structures on implant anneal buffer/strain relaxed buffer layers with epitaxial rare earth oxide interlayers and methods to fabricate same 2016-08-16
9412865 Reduced resistance short-channel InGaAs planar MOSFET Pranita Kerber, Qiqing C. Ouyang 2016-08-09
9406748 Perfectly shaped controlled nanowires Karthik Balakrishnan, Kangguo Cheng, Bruce B. Doris, Pouya Hashemi 2016-08-02
9406545 Bulk semiconductor fins with self-aligned shallow trench isolation structures Thomas N. Adam, Kangguo Cheng, Ali Khakifirooz 2016-08-02
9406529 Formation of FinFET junction Kevin K. Chan, Pouya Hashemi, Ali Khakifirooz, John A. Ott 2016-08-02
9406506 Lattice matched aspect ratio trapping to reduce defects in III-V layer directly grown on silicon Keith E. Fogel, Pouya Hashemi, Ali Khakifirooz 2016-08-02
9401311 Self aligned structure and method for high-K metal gate work function tuning Kangguo Cheng, Bruce B. Doris, Ali Khakifirooz 2016-07-26
9401373 Multi-fin finFETs with merged-fin source/drains and replacement gates Thomas N. Adam, Kangguo Cheng, Ali Khakifirooz 2016-07-26
9391173 FinFET device with vertical silicide on recessed source/drain epitaxy regions Keith E. Fogel, Pranita Kerber, Qiqing C. Ouyang 2016-07-12
9391077 SiGe and Si FinFET structures and methods for making the same Kangguo Cheng, Bruce B. Doris, Pouya Hashemi, Ali Khakifirooz 2016-07-12
9391069 MIM capacitor with enhanced capacitance formed by selective epitaxy Kangguo Cheng, Bruce B. Doris, Pouya Hashemi, Ali Khakifirooz, Raghavasimhan Sreenivasan 2016-07-12