NY

Natsuki Yokoyama

HI Hitachi: 30 patents #925 of 28,497Top 4%
RT Renesas Technology: 16 patents #96 of 3,337Top 3%
RE Renesas Electronics: 10 patents #332 of 4,529Top 8%
HC Hitachi Ulsi Systems Co.: 5 patents #151 of 867Top 20%
HD Hitachi Power Semiconductor Device: 2 patents #16 of 79Top 25%
FL Fujitsu Ten Limited: 1 patents #456 of 996Top 50%
HE Hitachi Vlsi Engineering: 1 patents #390 of 666Top 60%
JA Japan Science And Technology Agency: 1 patents #756 of 2,171Top 35%
HC Hitachi Cable: 1 patents #530 of 1,086Top 50%
Overall (All Time): #38,164 of 4,157,543Top 1%
61
Patents All Time

Issued Patents All Time

Showing 51–61 of 61 patents

Patent #TitleCo-InventorsDate
5981399 Method and apparatus for fabricating semiconductor devices Yoshio Kawamura, Tatuharu Yamamoto, Shigeo Moriyama, Yoshifumi Kawamoto, Fumihiko Uchida +2 more 1999-11-09
5858863 Fabrication system and method having inter-apparatus transporter Yoshifumi Kawamoto, Eiichi Murakami, Fumihiko Uchida, Kenichi Mizuishi, Yoshio Kawamura 1999-01-12
5820679 Fabrication system and method having inter-apparatus transporter Yoshifumi Kawamoto, Eiichi Murakami, Fumihiko Uchida, Kenichi Mizuishi, Yoshio Kawamura 1998-10-13
5601686 Wafer transport method Yoshio Kawamura, Yoshifumi Kawamoto, Fumihiko Uchida, Kenichi Mizuishi, Eiichi Murakami +2 more 1997-02-11
5562800 Wafer transport method Yoshio Kawamura, Yoshifumi Kawamoto, Fumihiko Uchida, Kenichi Mizuishi, Eiichi Murakami +2 more 1996-10-08
5270232 Process for fabricating field effect transistor Shinichiro Kimura, Shoji Shukuri, Hiromasa Noda, Digh Hisamoto, Hideyuki Matsuoka +4 more 1993-12-14
5270259 Method for fabricating an insulating film from a silicone resin using O.sub . Shinichi Ito, Yoshio Homma, Eiji Sasaki 1993-12-14
5177589 Refractory metal thin film having a particular step coverage factor and ratio of surface roughness Nobuyoshi Kobayashi, Hidekazu Goto, Masayuki Suzuki, Yoshio Homma, Yoshitaka Nakamura 1993-01-05
5175017 Method of forming metal or metal silicide film Nobuyoshi Kobayashi, Hidekazu Goto, Masayuki Suzuki, Yoshio Homma 1992-12-29
4897709 Titanium nitride film in contact hole with large aspect ratio Yoshio Homma, Kenji Hinode, Kiichiro Mukai 1990-01-30
4792842 Semiconductor device with wiring layer using bias sputtering Yoshio Honma, Sukeyoshi Tsunekawa, Hiroshi Morisaki 1988-12-20