SL

Sean Xuan Lin

Globalfoundries: 27 patents #97 of 4,424Top 3%
Illinois Tool Works: 2 patents #1,548 of 4,258Top 40%
ME Macdermid Enthone: 1 patents #35 of 53Top 70%
TSMC: 1 patents #8,466 of 12,232Top 70%
IBM: 1 patents #44,794 of 70,183Top 65%
IN Intermolecular: 1 patents #186 of 248Top 75%
GU Globalfoundries U.S.: 1 patents #344 of 665Top 55%
📍 Hopkins, MN: #6 of 249 inventorsTop 3%
🗺 Minnesota: #1,633 of 52,454 inventorsTop 4%
Overall (All Time): #101,128 of 4,157,543Top 3%
34
Patents All Time

Issued Patents All Time

Showing 26–34 of 34 patents

Patent #TitleCo-InventorsDate
9054052 Methods for integration of pore stuffing material Nicholas V. LiCausi, Errol Todd Ryan, Ming He, Moosung Chae, Kunaljeet Tanwar +4 more 2015-06-09
8932934 Methods of self-forming barrier integration with pore stuffed ULK material Moosung Chae, Errol Todd Ryan, Nicholas V. LiCausi, Christian Witt, Ailian Zhao +3 more 2015-01-13
8907483 Semiconductor device having a self-forming barrier layer at via bottom Larry Zhao, Ming He, Xunyuan Zhang 2014-12-09
8859419 Methods of forming copper-based nitride liner/passivation layers for conductive copper structures and the resulting device Xunyuan Zhang, Larry Zhao, Ming He, John A. Iacoponi, Errol Todd Ryan 2014-10-14
8778789 Methods for fabricating integrated circuits having low resistance metal gate structures Paul R. Besser, Valli Arunachalam 2014-07-15
8753975 Methods of forming conductive copper-based structures using a copper-based nitride seed layer without a barrier layer and the resulting device Xunyuan Zhang, Larry Zhao, Ming He, John A. Iacoponi, Errol Todd Ryan 2014-06-17
8691689 Methods for fabricating integrated circuits having low resistance device contacts Paul R. Besser, Valli Arunachalam 2014-04-08
8673766 Methods of forming copper-based conductive structures by forming a copper-based seed layer having an as-deposited thickness profile and thereafter performing an etching process and electroless copper deposition Ming He, Xunyuan Zhang, Larry Zhao 2014-03-18
8517769 Methods of forming copper-based conductive structures on an integrated circuit device Ming He, Xunyuan Zhang, Larry Zhao 2013-08-27