Issued Patents All Time
Showing 1–9 of 9 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11719895 | Spot-size converters with angled facets | Yusheng Bian, Nicholas A. Polomoff, Qizhi Liu, Steven M. Shank | 2023-08-08 |
| 11417525 | Multiple patterning with mandrel cuts defined by block masks | Martin O'Toole, Brendan O'Brien, Hsueh-Chung Chen, Terry A. Spooner, Craig Child +4 more | 2022-08-16 |
| 11158574 | Methods of forming a conductive contact structure to an embedded memory device on an IC product and a corresponding IC product | Nicholas V. LiCausi, Julien Frougier, Hyung Woo Kim | 2021-10-26 |
| 11121087 | Methods of forming a conductive contact structure to an embedded memory device on an IC product and a corresponding IC product | Nicholas V. LiCausi, Julien Frougier, Hyung Woo Kim | 2021-09-14 |
| 10651046 | Multiple patterning with late lithographically-defined mandrel cuts | Hsueh-Chung Chen, Brendan O'Brien, Martin O'Toole | 2020-05-12 |
| 10566231 | Interconnect formation with chamferless via, and related interconnect | Martin O'Toole, Christopher J. Penny, Jae-ouk Choo, Adam L. da Silva, Craig Child +3 more | 2020-02-18 |
| 10510675 | Substrate structure with spatial arrangement configured for coupling of surface plasmons to incident light | Somnath Ghosh, Eswar Ramanathan, Qanit Takmeel, Ming He, Jeric Sarad +4 more | 2019-12-17 |
| 10199270 | Multi-directional self-aligned multiple patterning | Colin Bombardier, Ming He, Vikrant Chauhan, Anbu Selvam KM Mahalingam | 2019-02-05 |
| 9287109 | Methods of forming a protection layer to protect a metal hard mask layer during lithography reworking processes | Torsten Huisinga, Robert Seidel | 2016-03-15 |