Issued Patents All Time
Showing 51–75 of 109 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6245485 | Positive resist composition | Shunichi Kondo, Tsuguo Yamaoka, Kenichiro Sato | 2001-06-12 |
| 6242153 | Positive photoresist composition for far ultraviolet ray exposure | Kenichiro Sato | 2001-06-05 |
| 6238842 | Positive photosensitive composition | Kenichiro Sato | 2001-05-29 |
| 6214517 | Positive photoresist composition | Kenichiro Sato | 2001-04-10 |
| 6200729 | Positive photosensitive composition | Kunihiko Kodama, Kazuya Uenishi, Tsukasa Yamanaka | 2001-03-13 |
| 6159656 | Positive photosensitive resin | Yasumasa Kawabe, Kenichiro Sato | 2000-12-12 |
| 6150068 | Photosensitive resin composition for far-ultraviolet exposure | Kenichiro Sato, Kunihiko Kodama, Kazuya Uenishi | 2000-11-21 |
| 6136504 | Positive-working photoresist composition | Shiro Tan, Toru Fujimori | 2000-10-24 |
| 6042991 | Positive working photosensitive composition | Shiro Tan, Kenichiro Sato | 2000-03-28 |
| 6037098 | Positive photosensitive composition | Satoshi Takita | 2000-03-14 |
| 6013411 | Positive working photosensitive composition | Toru Fujimori, Tsukasa Yamanaka, Kazuya Uenishi | 2000-01-11 |
| 6010820 | Positive photosensitive composition | Kunihiko Kodama, Kazuya Uenishi, Tsukasa Yamanaka | 2000-01-04 |
| 6004721 | Positive photoresist composition | Shiro Tan, Toru Fujimori | 1999-12-21 |
| 5981140 | Positive photosensitive composition | Kenichiro Sato, Kunihiko Kodama, Kazuya Uenishi | 1999-11-09 |
| 5955238 | Waterless planographic printing plate and method of plate making using the same | Hiroaki Yokoya, Kazuya Uenishi | 1999-09-21 |
| 5945250 | Positive photosensitive composition | Kenichiro Sato, Kunihiko Kodama | 1999-08-31 |
| 5939234 | Chemically amplified positive resist composition | Tsukasa Yamanaka, Toru Fujimori | 1999-08-17 |
| 5891603 | Positive working photosensitive composition | Kunihiko Kodama, Kazuya Uenishi | 1999-04-06 |
| 5837420 | Positive working photosensitive composition | Kunihiko Kodama, Kazuya Uenishi, Tsukasa Yamanaka | 1998-11-17 |
| 5824451 | Positive photosensitive composition | Tsukasa Yamanaka | 1998-10-20 |
| 5707776 | Positive resin composition sensitive to ultraviolet rays | Yasumasa Kawabe, Tsukasa Yamanaka | 1998-01-13 |
| 5707777 | Light-sensitive composition | Tadayoshi Kokubo | 1998-01-13 |
| 5700620 | Radiation ray sensitive resin compostion containing at least two different naphthoquinonediazide sulfonic acid esters and an alkali-soluble low-molecular compound | Shinji Sakaguchi, Kenichiro Sato | 1997-12-23 |
| 5693452 | Positive chemically amplified resist composition | Toru Fujimori | 1997-12-02 |
| 5683856 | Positive-working photosensitive composition | Tsukasa Yamanaka, Kazuya Uenishi | 1997-11-04 |