TA

Toshiaki Aoai

Fujitsu Limited: 94 patents #50 of 24,456Top 1%
FU Fujifilm: 15 patents #581 of 4,519Top 15%
Overall (All Time): #12,236 of 4,157,543Top 1%
109
Patents All Time

Issued Patents All Time

Showing 76–100 of 109 patents

Patent #TitleCo-InventorsDate
5609982 Positive-working photoresist composition Kenichiro Sato, Yasumasa Kawabe, Shinji Sakaguchi 1997-03-11
5576143 Light-sensitive composition Tadayoshi Kokubo 1996-11-19
5554481 Positive working photoresist composition Yasumasa Kawabe, Kenichiro Satoh 1996-09-10
5529881 Postive photoresist composition Yasumasa Kawabe, Kenichiro Sato, Kazuya Uenishi 1996-06-25
5523396 Process for synthesizing quinonediazide ester utilizing base catalyst Kenichiro Sato, Yasumasa Kawabe 1996-06-04
5340688 Positive type photoresist composition Yasumasa Kawabe, Tadayoshi Kokubo 1994-08-23
5338640 Siloxane polymers and positive working light-sensitive compositions comprising the same Kazuyoshi Mizutani 1994-08-16
5320928 Photosensitive composition comprising a diazonium compound and a polyurethane 1994-06-14
5318875 Positive quinonediazide photoresist composition containing select hydroxyphenol additive Yasumasa Kawabe, Tadayoshi Kokubo, Shiro Tan 1994-06-07
5294511 Photosensitive composition Mitsunori Ono 1994-03-15
5278273 Siloxane polymers and positive working light-sensitive compositions comprising the same Kazuyoshi Mizutani 1994-01-11
5276124 Siloxane polymers and positive working light-sensitive compositions comprising the same Kazuyoshi Mizutani 1994-01-04
5254432 Photosensitive composition 1993-10-19
5252686 Siloxane polymers and positive working light-sensitive compositions comprising the same Kazuyoshi Mizutani 1993-10-12
5216105 Silicone polymers and positive working light-sensitive compositions comprising the same Kazuyoshi Mizutani 1993-06-01
5204217 Photosensitive composition Mitsunori Ono 1993-04-20
5143816 Light-sensitive composition comprising a polysiloxane and a naphthoquinone Kazuyoshi Mizutani 1992-09-01
5141840 Light-sensitive composition containing onium salt and polysiloxane reaction product Kazuyoshi Mizutani 1992-08-25
5110709 Light-sensitive positive working composition containing a pisolfone compound Tadayoshi Kokubo 1992-05-05
5069992 Electrophotographic printing plate precursor containing alkali-soluble polyurethane resin as binder resin Hiromichi Tachikawa, Hiroaki Yokoya, Syu Watarai 1991-12-03
5002853 Positive working photosensitive composition Teruo Nagano 1991-03-26
4983491 Photosensitive diazo resin composition with polyurethane resin having carboxyl group in its main chain Kazuo Maemoto, Akihiko Kamiya 1991-01-08
4950582 Light-sensitive composition Keitaro Aoshima, Yasuo Okamoto 1990-08-21
4904563 Microcapsules and light-sensitive recording material using the same Yoshimasa Aotani 1990-02-27
4898803 Light-sensitive o-quinone diazide composition with acidic polyurethane resin Keitaro Aoshima, Akira Nagashima 1990-02-06