TA

Toshiaki Aoai

Fujitsu Limited: 94 patents #50 of 24,456Top 1%
FU Fujifilm: 15 patents #581 of 4,519Top 15%
Overall (All Time): #12,236 of 4,157,543Top 1%
109
Patents All Time

Issued Patents All Time

Showing 26–50 of 109 patents

Patent #TitleCo-InventorsDate
6794108 Positive photoresist composition for far ultraviolet exposure Kenichiro Sato, Yutaka Adegawa, Kunihiko Kodama 2004-09-21
6790970 (Meth) acrylic acid ester compound Kenichiro Sato 2004-09-14
6787283 Positive photoresist composition for far ultraviolet exposure Kenichiro Sato, Kunihiko Kodama 2004-09-07
6749987 Positive photosensitive composition Kunihiko Kodama 2004-06-15
6720128 Positive resist composition Yutaka Adegawa, Ippei Nakamura 2004-04-13
6699635 Positive photosensitive composition Kunihiko Kodama, Kenichiro Sato, Yasumasa Kawabe 2004-03-02
6692884 Positive photoresist composition Toru Fujimori, Kunihiko Kodama, Kenichiro Sato 2004-02-17
6670095 Positive-working resist composition Kenichiro Sato, Kunihiko Kodama 2003-12-30
6638683 Positive photoresist composition Shiro Tan, Toru Fujimori 2003-10-28
6632586 Positive resist composition Kenichiro Sato 2003-10-14
6602646 Positive-working resist composition Kenichiro Sato, Kunihiko Kodama 2003-08-05
6596458 Positive-working photoresist composition Kenichiro Sato, Kunihiko Kodama, Yasumasa Kawabe 2003-07-22
6576392 Positive photoresist composition Kenichiro Sato, Kunihiko Kodama, Hidekazu Ohashi 2003-06-10
6544715 Positive photoresist composition for far ultraviolet ray exposure Kenichiro Sato, Kunihiko Kodama 2003-04-08
6517991 Positive photosensitive composition Kunihiko Kodama, Kenichiro Sato 2003-02-11
6492091 Positive photosensitive composition Kunihiko Kodama 2002-12-10
6485883 Positive photoresist composition Kunihiko Kodama, Shinichi Kanna 2002-11-26
6479209 Positive photosensitive composition Kenichiro Sato, Morio Yagihara 2002-11-12
6479211 Positive photoresist composition for far ultraviolet exposure Kenichiro Sato, Kunihiko Kodama, Hajime Nakao 2002-11-12
6420082 Positive resist fluid and positive resist composition Kenichiro Sato, Kunihiko Kodama 2002-07-16
6416925 Positive working photosensitive composition Shiro Tan, Kenichiro Sato 2002-07-09
6410204 Positive photoresist composition Kunihiko Kodama, Kenichiro Sato 2002-06-25
6379860 Positive photosensitive composition Toru Fujimori, Yasunori Takata, Shiro Tan 2002-04-30
6291130 Positive photosensitive composition Kunihiko Kodama, Kenichiro Sato 2001-09-18
6265135 Positive-working electron beam or X-ray resist composition Kunihiko Kodama, Kazuya Uenishi 2001-07-24