Issued Patents All Time
Showing 101–109 of 109 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 4877711 | Light-sensitive diazo photopolymerizable composition with polyurethane having carbon-carbon unsaturated and a carboxyl group | Kazuo Maemoto, Akihiko Kamiya, Hiroshi Misu | 1989-10-31 |
| 4842986 | Positively working resist material | Nobuaki Matsuda, Tadayoshi Kokubo, Akira Umehara, Yoshimasa Aotani | 1989-06-27 |
| 4820607 | Photosolubilizable composition | — | 1989-04-11 |
| 4816375 | Photosolubilizable composition with silyl ether or silyl ester compound | — | 1989-03-28 |
| 4786577 | Photo-solubilizable composition admixture with radiation sensitive acid producing compound and silyl ether group containing compound with either urethane, ureido, amido, or ester group | Akihiko Kamiya | 1988-11-22 |
| 4766037 | Photodegradable microcapsules | Akio Watanabe, Shintaro Washizu, Fumiaki Shinozaki, Shun-ichi Ishikawa | 1988-08-23 |
| 4752552 | Photosolubilizable composition | — | 1988-06-21 |
| 4741985 | Light-sensitive composition comprising a diazonium salt condensate and a modified polyvinyl acetal polymer. | Kazuo Maemoto, Akihiko Kamiya, Toshiyuki Sekiya | 1988-05-03 |
| 4536464 | Photosensitive composition with o-quinonediazide compound and condensate of dihydric phenol and aldehyde or ketone | Akira Nagashima, Akira Hasegawa, Teruo Nagano | 1985-08-20 |