TT

Tomotaka Tsuchimura

FU Fujifilm: 69 patents #27 of 4,519Top 1%
Fujitsu Limited: 4 patents #7,093 of 24,456Top 30%
Overall (All Time): #27,080 of 4,157,543Top 1%
73
Patents All Time

Issued Patents All Time

Showing 26–50 of 73 patents

Patent #TitleCo-InventorsDate
9235116 Actinic-ray- or radiation sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming pattern Takeshi Inasaki, Takeshi Kawabata 2016-01-12
9223208 Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition Takayuki Ito 2015-12-29
9223204 Actinic ray-sensitive or radiation-sensitive resin composition, resist film, and pattern-forming method using the same Takayuki Ito, Hidenori Takahashi, Shohei Kataoka, Takeshi Inasaki 2015-12-29
9217919 Photosensitive composition, pattern-forming method using the composition, and resin used in the composition Hidenori Takahashi, Toru Tsuchihashi, Katsuhiro Yamashita, Naoyuki Nishikawa 2015-12-22
9091927 Positive resist composition, and resist film, resist-coated mask blank, resist pattern forming method and photomask each using the composition Takeshi Inasaki 2015-07-28
9069246 Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method and resist film using the composition, and electronic device manufacturing method and electronic device using these Hiroo Takizawa 2015-06-30
8962233 Actinic-ray—or radiation-sensitive resin composition and method of forming pattern using the composition Takeshi Kawabata, Takayuki Ito 2015-02-24
8940471 Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition Takeshi Kawabata, Takayuki Ito 2015-01-27
8900791 Actinic ray-sensitive or radiation-sensitive resin composition and method of forming pattern with the composition Koji Shirakawa, Toru Tsuchihashi, Hideaki Tsubaki 2014-12-02
8895222 Actinic ray-sensitive or radiation-sensitive resin composition and resist film and pattern forming method using the composition Hidenori Takahashi, Takayuki Ito, Takeshi Inasaki, Shohei Kataoka 2014-11-25
8895909 Photosensitive resin composition, light-shielding color filter, method of producing the same and solid-state image sensor Yoichi Maruyama, Hiroyuki Einaga, Toru Fujimori, Kazuto Shimada, Yushi Kaneko 2014-11-25
8889339 Resist pattern forming method, resist pattern, crosslinkable negative chemical amplification resist composition for organic solvent development, resist film and resist-coated mask blanks Toru Tsuchihashi, Tadateru Yatsuo, Koutarou Takahashi 2014-11-18
8872099 Solid-state image sensor including a light-shielding color filter formed from a photosensitive resin composition, photosensitive resin composition and method of producing a light-shielding color filter Yoichi Maruyama, Hiroyuki Einaga, Toru Fujimori, Kazuto Shimada, Yushi Kaneko 2014-10-28
8852845 Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method using the same, and resin Hidenori Takahashi, Toru Tsuchihashi, Katsuhiro Yamashita, Hideaki Tsubaki 2014-10-07
8846277 Compound, polymerizable composition, color filter, and method of producing the same, solid-state imaging device, and planographic printing plate precursor Masaomi Makino 2014-09-30
8808961 Composition, resist film, pattern forming method, and inkjet recording method Takeshi Kawabata, Takayuki Ito 2014-08-19
8778593 Chemical amplification resist composition, and resist film, resist-coated mask blank, resist pattern forming method and photomask each using the composition Tadateru Yatsuo 2014-07-15
8741542 Actinic ray-sensitive or radiation-sensitive resin composition, film formed using the composition and pattern forming method using the same Takayuki Ito, Toru Fujimori, Kana Fujii 2014-06-03
8735026 Polymerizable composition, light-blocking color filter for solid-state imaging device, and solid-state imaging device Kazuto Shimada, Yoichi Maruyama, Toru Fujimori, Yushi Kaneko, Hiroyuki Einaga 2014-05-27
8735048 Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the composition and pattern forming method Takeshi Inasaki, Takayuki Ito, Tadateru Yatsuo, Koutarou Takahashi 2014-05-27
8728686 Photosensitive compositions, curable compositions, novel compounds, photopolymerizable compositions, color filters, and planographic printing plate precursors 2014-05-20
8673538 Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the composition Takeshi Inasaki 2014-03-18
8642245 Actinic-ray- or radiation-sensitive resin composition and method of forming a pattern using the same Kana Fujii, Toru Fujimori, Hidenori Takahashi, Takayuki Ito 2014-02-04
8637220 Actinic ray-sensitive or radiation-sensitive resin composition, and resist film and pattern forming method using the composition Hideaki Tsubaki, Toshiya Takahashi 2014-01-28
8614033 Resist film, resist coated mask blanks and method of forming resist pattern using the resist film, and chemical amplification type resist composition Takeshi Inasaki, Hiroo Takizawa 2013-12-24