Issued Patents All Time
Showing 1–20 of 20 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10128076 | Inductively coupled plasma ion source with tunable radio frequency power | Roderick Boswell, Paul P. Tesch, Noel P. Martin, Philip J. Witham | 2018-11-13 |
| 9655223 | RF system, magnetic filter, and high voltage isolation for an inductively coupled plasma ion source | Roderick Boswell, Paul P. Tesch, Noel P. Martin | 2017-05-16 |
| 9640367 | Plasma source for a focused ion beam system | John H. Keller, Roderick Boswell, Lawrence Scipioni, Christine Charles, Orson Sutherland | 2017-05-02 |
| 9530625 | Method for attachment of an electrode into an inductively-coupled plasma | Sean Kellogg, Anthony Graupera, William Parker, Andrew B. Wells, Mark W. Utlaut +3 more | 2016-12-27 |
| 9401262 | Multi-source plasma focused ion beam system | Clive D. Chandler, Mark W. Utlaut, Paul P. Tesch, David William Tuggle | 2016-07-26 |
| 9196451 | Plasma source for charged particle beam system | Shouyin Zhang, Walter Skoczylas | 2015-11-24 |
| 9053895 | System for attachment of an electrode into a plasma source | Sean Kellogg, Anthony Graupera, N. William Parker, Andrew B. Wells, Mark W. Utlaut +3 more | 2015-06-09 |
| 9029812 | Multi-source plasma focused ion beam system | Clive D. Chandler, Mark W. Utlaut, Paul P. Tesch, David William Tuggle | 2015-05-12 |
| 8835880 | Charged particle-beam processing using a cluster source | Clive D. Chandler | 2014-09-16 |
| 8829468 | Magnetically enhanced, inductively coupled plasma source for a focused ion beam system | John H. Keller, Roderick Boswell, Lawrence Scipioni, Christine Charles, Orson Sutherland | 2014-09-09 |
| 8692217 | Multi-source plasma focused ion beam system | Clive D. Chandler, Mark W. Utlaut, Paul P. Tesch, Dave Tuggle | 2014-04-08 |
| 8530006 | Localized plasma processing | Clive D. Chandler | 2013-09-10 |
| 8525419 | High voltage isolation and cooling for an inductively coupled plasma ion source | Noel P. Martin, Paul P. Tesch | 2013-09-03 |
| 8405054 | Multi-source plasma focused ion beam system | Clive D. Chandler, Mark W. Utlaut, Paul P. Tesch, Dave Tuggle | 2013-03-26 |
| 8303833 | High resolution plasma etch | Milos Toth | 2012-11-06 |
| 8168957 | Magnetically enhanced, inductively coupled plasma source for a focused ion beam system | John H. Keller, Roderick Boswell, Lawrence Scipioni, Christine Charles, Orson Sutherland | 2012-05-01 |
| 8087379 | Localized plasma processing | Clive D. Chandler | 2012-01-03 |
| 8076650 | Multi-source plasma focused ion beam system | Clive D. Chandler, Mark W. Utlaut, Paul P. Tesch, Dave Tuggle | 2011-12-13 |
| 7670455 | Magnetically enhanced, inductively coupled plasma source for a focused ion beam system | John H. Keller, Roderick Boswell, Lawrence Scipioni, Christine Charles, Orson Sutherland | 2010-03-02 |
| 7241361 | Magnetically enhanced, inductively coupled plasma source for a focused ion beam system | John H. Keller, Roderick Boswell, Lawrence Scipioni, Christine Charles, Orson Sutherland | 2007-07-10 |