| 10128076 |
Inductively coupled plasma ion source with tunable radio frequency power |
Roderick Boswell, Paul P. Tesch, Noel P. Martin, Philip J. Witham |
2018-11-13 |
|
| 9655223 |
RF system, magnetic filter, and high voltage isolation for an inductively coupled plasma ion source |
Roderick Boswell, Paul P. Tesch, Noel P. Martin |
2017-05-16 |
|
| 9640367 |
Plasma source for a focused ion beam system |
John H. Keller, Roderick Boswell, Lawrence Scipioni, Christine Charles, Orson Sutherland |
2017-05-02 |
|
| 9530625 |
Method for attachment of an electrode into an inductively-coupled plasma |
Sean Kellogg, Anthony Graupera, William Parker, Andrew B. Wells, Mark W. Utlaut +3 more |
2016-12-27 |
|
| 9401262 |
Multi-source plasma focused ion beam system |
Clive D. Chandler, Mark W. Utlaut, Paul P. Tesch, David William Tuggle |
2016-07-26 |
$29,414,000 |
| 9196451 |
Plasma source for charged particle beam system |
Shouyin Zhang, Walter Skoczylas |
2015-11-24 |
$9,360,000 |
| 9053895 |
System for attachment of an electrode into a plasma source |
Sean Kellogg, Anthony Graupera, N. William Parker, Andrew B. Wells, Mark W. Utlaut +3 more |
2015-06-09 |
$9,139,000 |
| 9029812 |
Multi-source plasma focused ion beam system |
Clive D. Chandler, Mark W. Utlaut, Paul P. Tesch, David William Tuggle |
2015-05-12 |
$8,802,000 |
| 8835880 |
Charged particle-beam processing using a cluster source |
Clive D. Chandler |
2014-09-16 |
$4,686,000 |
| 8829468 |
Magnetically enhanced, inductively coupled plasma source for a focused ion beam system |
John H. Keller, Roderick Boswell, Lawrence Scipioni, Christine Charles, Orson Sutherland |
2014-09-09 |
$10,073,000 |
| 8692217 |
Multi-source plasma focused ion beam system |
Clive D. Chandler, Mark W. Utlaut, Paul P. Tesch, Dave Tuggle |
2014-04-08 |
$8,114,000 |
| 8530006 |
Localized plasma processing |
Clive D. Chandler |
2013-09-10 |
$17,718,000 |
| 8525419 |
High voltage isolation and cooling for an inductively coupled plasma ion source |
Noel P. Martin, Paul P. Tesch |
2013-09-03 |
|
| 8405054 |
Multi-source plasma focused ion beam system |
Clive D. Chandler, Mark W. Utlaut, Paul P. Tesch, Dave Tuggle |
2013-03-26 |
$4,818,000 |
| 8303833 |
High resolution plasma etch |
Milos Toth |
2012-11-06 |
$6,752,000 |
| 8168957 |
Magnetically enhanced, inductively coupled plasma source for a focused ion beam system |
John H. Keller, Roderick Boswell, Lawrence Scipioni, Christine Charles, Orson Sutherland |
2012-05-01 |
$2,973,000 |
| 8087379 |
Localized plasma processing |
Clive D. Chandler |
2012-01-03 |
$13,138,000 |
| 8076650 |
Multi-source plasma focused ion beam system |
Clive D. Chandler, Mark W. Utlaut, Paul P. Tesch, Dave Tuggle |
2011-12-13 |
$12,491,000 |
| 7670455 |
Magnetically enhanced, inductively coupled plasma source for a focused ion beam system |
John H. Keller, Roderick Boswell, Lawrence Scipioni, Christine Charles, Orson Sutherland |
2010-03-02 |
$2,482,000 |
| 7241361 |
Magnetically enhanced, inductively coupled plasma source for a focused ion beam system |
John H. Keller, Roderick Boswell, Lawrence Scipioni, Christine Charles, Orson Sutherland |
2007-07-10 |
$11,372,000 |