Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › High resolution plasma etch

High resolution plasma etch

US Patent 8303833 · Granted Nov 6, 2012

Estimated economic value: $6,752,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Particle-induced x-ray emission (PIXE) using hydrogen and multi-species focused 2024
Nanofabrication using a new class of electron beam induced surface processing te2022
Method and system for plasma assisted low vacuum charged-particle microscopy2021
Method for alignment of a light beam to a charged particle beam2020
Nanofabrication using a new class of electron beam induced surface processing te2020
Attachment of nano-objects to beam-deposited structures2019
Method and apparatus for laser machining2019
Electron beam-induced etching2019
Inductively coupled plasma ion source with tunable radio frequency power2018
Method of depositing material2018
Localized, in-vacuum modification of small structures2017
Charged particle beam processing using process gas and cooled surface2017