Issued Patents All Time
Showing 25 most recent of 57 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12139412 | Halogen generator | — | 2024-11-12 |
| 11072528 | Halogen generator | — | 2021-07-27 |
| 10501851 | Attachment of nano-objects to beam-deposited structures | Mehran Kianinia, Olga Shimoni, Igor Aharonovich, Charlene Lobo, Milos Toth +1 more | 2019-12-10 |
| 10103008 | Charged particle beam-induced etching | — | 2018-10-16 |
| 9761467 | Gas injection system with precursor for planar deprocessing of semiconductor devices using a focused ion beam | Chad Rue | 2017-09-12 |
| 9733164 | Lamella creation method and device using fixed-angle beam and rotating sample stage | Andrew B. Wells, N. William Parker, Mark W. Utlaut | 2017-08-15 |
| 9478390 | Integrated light optics and gas delivery in a charged particle lens | N. William Parker, Marcus Straw, Jorge Filevich, Aurelien Philippe Jean Maclou Botman, Steven Randolph +1 more | 2016-10-25 |
| 9401262 | Multi-source plasma focused ion beam system | Noel Smith, Mark W. Utlaut, Paul P. Tesch, David William Tuggle | 2016-07-26 |
| 9334568 | Beam-induced deposition of low-resistivity material | Steven Randolph | 2016-05-10 |
| 9150961 | Gas delivery for beam processing systems | Steven Randolph, Gavin Hartigan | 2015-10-06 |
| 9090973 | Beam-induced deposition of low-resistivity material | Steven Randolph | 2015-07-28 |
| 9070533 | Environmental scanning electron microscope (ESEM/SEM) gas injection apparatus with anode integrated with gas concentrating structure | Marc Castagna, Wayne Kurowski, Daniel Woodrow Phifer, Jr. | 2015-06-30 |
| 9064811 | Precursor for planar deprocessing of semiconductor devices using a focused ion beam | Chad Rue | 2015-06-23 |
| 9029812 | Multi-source plasma focused ion beam system | Noel Smith, Mark W. Utlaut, Paul P. Tesch, David William Tuggle | 2015-05-12 |
| 8835880 | Charged particle-beam processing using a cluster source | Noel Smith | 2014-09-16 |
| 8778804 | High selectivity, low damage electron-beam delineation etch | Steven Randolph | 2014-07-15 |
| 8692217 | Multi-source plasma focused ion beam system | Noel Smith, Mark W. Utlaut, Paul P. Tesch, Dave Tuggle | 2014-04-08 |
| 8617668 | Method of using nitrogen based compounds to reduce contamination in beam-induced thin film deposition | Milos Toth, Charlene Lobo, Steven Randolph | 2013-12-31 |
| 8530006 | Localized plasma processing | Noel Smith | 2013-09-10 |
| 8405054 | Multi-source plasma focused ion beam system | Noel Smith, Mark W. Utlaut, Paul P. Tesch, Dave Tuggle | 2013-03-26 |
| 8333820 | Forming conductive features of electronic devices | Mark J. Hampden-Smith, Toivo T. Kodas, Quint H. Powell, Daniel J. Skamser, James Caruso | 2012-12-18 |
| 8087379 | Localized plasma processing | Noel Smith | 2012-01-03 |
| 8076650 | Multi-source plasma focused ion beam system | Noel Smith, Mark W. Utlaut, Paul P. Tesch, Dave Tuggle | 2011-12-13 |
| 7727630 | Coated nickel-containing powders | Toivo T. Kodas, Mark J. Hampden-Smith, James Caruso, Quint H. Powell, Daniel J. Skamser | 2010-06-01 |
| 7632331 | Aerosol method and apparatus, particulate products, and electronic devices made therefrom | Mark J. Hampden-Smith, Toivo T. Kodas, Quint H. Powell, Daniel J. Skamser, James Caruso | 2009-12-15 |