Issued Patents All Time
Showing 51–73 of 73 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7408643 | Method and apparatus for inspecting samples, and method for manufacturing devices using method and apparatus for inspecting samples | Mamoru Nakasuji, Tohru Satake | 2008-08-05 |
| 7365324 | Testing apparatus using charged particles and device manufacturing method using the testing apparatus | Nobuharu Noji, Tohru Satake, Hirosi Sobukawa, Masahiro Hatakeyama, Shoji Yoshikawa +7 more | 2008-04-29 |
| 7297949 | Inspection system by charged particle beam and method of manufacturing devices using the system | Mamoru Nakasuji, Nobuharu Noji, Tohru Satake, Hirosi Sobukawa, Shoji Yoshikawa +5 more | 2007-11-20 |
| 7247848 | Electron beam apparatus and method of manufacturing semiconductor device using the apparatus | Mamoru Nakasuji, Tohru Satake, Kenji Watanabe, Takeshi Murakami, Nobuharu Noji +9 more | 2007-07-24 |
| 7248353 | Method and apparatus for inspecting samples, and method for manufacturing devices using method and apparatus for inspecting samples | Mamoru Nakasuji, Tohru Satake | 2007-07-24 |
| 7244933 | Electron beam apparatus, a pattern evaluation method and a device manufacturing method using the electron beam apparatus or pattern evaluation method | Mamoru Nakasuji, Takao Kato, Tohru Satake | 2007-07-17 |
| 7244932 | Electron beam apparatus and device fabrication method using the electron beam apparatus | Mamoru Nakasuji, Tohru Satake, Nobuharu Noji, Hirosi Sobukawa, Tsutomu Karimata +6 more | 2007-07-17 |
| 7241993 | Inspection system by charged particle beam and method of manufacturing devices using the system | Mamoru Nakasuji, Nobuharu Noji, Tohru Satake, Masahiro Hatakeyama, Hirosi Sobukawa +9 more | 2007-07-10 |
| 7223973 | Apparatus for inspection with electron beam, method for operating same, and method for manufacturing semiconductor device using former | Tohru Satake, Tsutomu Karimata, Kenji Watanabe, Nobuharu Noji, Takeshi Murakami +6 more | 2007-05-29 |
| 7138629 | Testing apparatus using charged particles and device manufacturing method using the testing apparatus | Nobuharu Noji, Tohru Satake, Hirosi Sobukawa, Masahiro Hatakeyama, Shoji Yoshikawa +7 more | 2006-11-21 |
| 7135676 | Inspection system by charged particle beam and method of manufacturing devices using the system | Mamoru Nakasuji, Nobuharu Noji, Tohru Satake, Hirosi Sobukawa, Shoji Yoshikawa +5 more | 2006-11-14 |
| 7129485 | Electron beam apparatus and method of manufacturing semiconductor device using the apparatus | Mamoru Nakasuji, Nobuharu Noji, Tohru Satake, Masahiro Hatakeyama, Kenji Watanabe +7 more | 2006-10-31 |
| 7109483 | Method for inspecting substrate, substrate inspecting system and electron beam apparatus | Mamoru Nakasuji, Nobuharu Noji, Tohru Satake, Masahiro Hatakeyama, Kenji Watanabe +6 more | 2006-09-19 |
| 7109484 | Sheet beam-type inspection apparatus | Mamoru Nakasuji, Nobuharu Noji, Tohru Satake, Hirosi Sobukawa, Tsutomu Karimata +3 more | 2006-09-19 |
| 7095022 | Electron beam apparatus and method of manufacturing semiconductor device using the apparatus | Mamoru Nakasuji, Nobuharu Noji, Tohru Satake, Masahiro Hatakeyama, Kenji Watanabe +7 more | 2006-08-22 |
| 7072050 | Substrate film thickness measurement method, substrate film thickness measurement apparatus and substrate processing apparatus | Shunsuke Nakai | 2006-07-04 |
| 7049585 | Sheet beam-type testing apparatus | Mamoru Nakasuji, Nobuharu Noji, Tohru Satake, Hirosi Sobukawa, Tsutomu Karimata +3 more | 2006-05-23 |
| 7012251 | Electron beam apparatus, a pattern evaluation method and a device manufacturing method using the electron beam apparatus or pattern evaluation method | Mamoru Nakasuji, Takao Kato, Tohru Satake | 2006-03-14 |
| 6855929 | Apparatus for inspection with electron beam, method for operating same, and method for manufacturing semiconductor device using former | Tohru Satake, Tsutomu Karimata, Kenji Watanabe, Nobuharu Noji, Takeshi Murakami +6 more | 2005-02-15 |
| 6785010 | Substrate film thickness measurement method, substrate film thickness measurement apparatus and substrate processing apparatus | Shunsuke Nakai | 2004-08-31 |
| 6657737 | Method and apparatus for measuring film thickness | Shunsuke Nakai | 2003-12-02 |
| 6593152 | Electron beam apparatus and method of manufacturing semiconductor device using the apparatus | Mamoru Nakasuji, Tohru Satake, Kenji Watanabe, Takeshi Murakami, Nobuharu Noji +9 more | 2003-07-15 |
| 5812892 | Multi-beam image forming system | Hisaji Miyoshi, Tamihiro Miyoshi | 1998-09-22 |