Issued Patents All Time
Showing 1–21 of 21 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11854638 | Nonvolatile semiconductor storage device and read voltage correction method | Atsufumi Kawamura, Yasuhisa Marumo, Handa Chen | 2023-12-26 |
| 10207390 | Processing end point detection method, polishing method, and polishing apparatus | Noburu Shimizu, Shinro Ohta, Koji Maruyama, Yoichi Kobayashi, Ryuichiro Mitani +1 more | 2019-02-19 |
| 8554356 | Processing end point detection method, polishing method, and polishing apparatus | Noburu Shimizu, Shinro Ohta, Koji Maruyama, Yoichi Kobayashi, Ryuichiro Mitani +1 more | 2013-10-08 |
| 8342907 | Polishing state monitoring method | Yoichi Kobayashi, Hitoshi Tsuji, Yasuo Tsukuda, Junki Ishimoto, Kazunari Shinya | 2013-01-01 |
| 7675634 | Substrate film thickness measurement method, substrate film thickness measurement apparatus and substrate processing apparatus | Toshifumi Kimba | 2010-03-09 |
| 7645181 | Polishing state monitoring apparatus and polishing apparatus | Yoichi Kobayashi, Hitoshi Tsuji, Yasuo Tsukuda, Junki Ishimoto, Kazunari Shinya | 2010-01-12 |
| 7585204 | Substrate polishing apparatus | Yoichi Kobayashi, Hitoshi Tsuji, Yasuo Tsukuda, Hiroki Yamauchi | 2009-09-08 |
| 7547242 | Substrate polishing apparatus | Kazuto Hirokawa, Yoichi Kobayashi, Shinrou Ohta, Yasuo Tsukuda | 2009-06-16 |
| 7510460 | Substrate polishing apparatus | Yoichi Kobayashi, Hitoshi Tsuji, Yasuo Tsukuda, Hiroki Yamauchi | 2009-03-31 |
| 7507144 | Substrate polishing apparatus | Kazuto Hirokawa, Shinrou Ohta, Yutaka Wada, Yoichi Kobayashi | 2009-03-24 |
| 7438627 | Polishing state monitoring method | Yoichi Kobayashi, Hitoshi Tsuji, Yasuo Tsukuda, Junki Ishimoto, Kazunari Shinya | 2008-10-21 |
| 7428064 | Substrate film thickness measurement method, substrate film thickness measurement apparatus and substrate processing apparatus | Toshifumi Kimba | 2008-09-23 |
| 7252575 | Polishing state monitoring apparatus and polishing apparatus and method | Yoichi Kobayashi, Hitoshi Tsuji, Yasuo Tsukuda, Junki Ishimoto, Kazunari Shinya | 2007-08-07 |
| 7241202 | Substrate polishing apparatus | Yoichi Kobayashi, Hitoshi Tsuji, Yasuo Tsukuda, Hiroki Yamauchi | 2007-07-10 |
| 7214122 | Substrate polishing apparatus | Kazuto Hirokawa, Shinrou Ohta, Yutaka Wada, Yoichi Kobayashi | 2007-05-08 |
| 7101257 | Substrate polishing apparatus | Kazuto Hirokawa, Yoichi Kobayashi, Shinro Ohta, Yasuo Tsukuda | 2006-09-05 |
| 7072050 | Substrate film thickness measurement method, substrate film thickness measurement apparatus and substrate processing apparatus | Toshifumi Kimba | 2006-07-04 |
| 6942543 | Substrate polishing apparatus | Yoichi Kobayashi, Hitoshi Tsuji, Yasuo Tsukuda, Hiroki Yamauchi | 2005-09-13 |
| 6785010 | Substrate film thickness measurement method, substrate film thickness measurement apparatus and substrate processing apparatus | Toshifumi Kimba | 2004-08-31 |
| 6758723 | Substrate polishing apparatus | Yoichi Kobayashi, Hitoshi Tsuji, Yasuo Tsukuda, Hiroki Yamauchi | 2004-07-06 |
| 6657737 | Method and apparatus for measuring film thickness | Toshifumi Kimba | 2003-12-02 |