| 7578886 |
Substrate processing apparatus, substrate processing method, and substrate holding apparatus |
Kaoru Yamada, Takayuki Saito, Sumio Yabe, Kenya Ito, Masayuki Kamezawa +2 more |
2009-08-25 |
| 7578887 |
Apparatus for and method of processing substrate |
Shinji Kajita, Haruko Ono, Yuki Inoue, Sachiko Takeda |
2009-08-25 |
| 7309449 |
Substrate processing method |
Haruko Ono, Sachiko Takeda |
2007-12-18 |
| 6921466 |
Revolution member supporting apparatus and semiconductor substrate processing apparatus |
Akihisa Hongo, Shinya Morisawa |
2005-07-26 |
| 6776919 |
Method and apparatus for etching ruthenium films |
Akira Fukunaga, Haruko Ohno, Sachiko Kihara |
2004-08-17 |
| 6745784 |
Method of and apparatus for cleaning substrate |
Shinya Morisawa, Haruko Ohno, Sachiko Kihara, Akira Fukunaga |
2004-06-08 |
| 6558478 |
Method of and apparatus for cleaning substrate |
Shinya Morisawa, Haruko Ohno, Sachiko Kihara, Akira Fukunaga |
2003-05-06 |
| 5943578 |
Method of manufacturing a semiconductor device having an element isolating region |
Naoto Miyashita, Hiroshi Kawamoto |
1999-08-24 |
| 5880032 |
Method and apparatus for manufacturing a semiconductor device |
Kenji Doi, Naoto Miyashita |
1999-03-09 |
| 5878191 |
Heat treatment apparatus for semiconductor wafers |
Naoto Miyashita, Hiroshi Kawamoto, Kenji Doi, Tsuyoshi Okuda |
1999-03-02 |
| 5643046 |
Polishing method and apparatus for detecting a polishing end point of a semiconductor wafer |
Naoto Miyashita, Tatsuo Akiyama |
1997-07-01 |
| 5605488 |
Polishing apparatus of semiconductor wafer |
Hiroyuki Ohashi, Naoto Miyashita, Tetsuya Tsukihara |
1997-02-25 |