JW

Joachim Wienecke

DA Danaher: 14 patents #93 of 2,950Top 4%
VG Vistec Semiconductor Systems Jena Gmbh: 2 patents #1 of 13Top 8%
JG Jenoptik Technologie Gmbh: 1 patents #5 of 26Top 20%
VG Vistec Semiconductor Systems Gmbh: 1 patents #20 of 55Top 40%
Overall (All Time): #259,162 of 4,157,543Top 7%
18
Patents All Time

Issued Patents All Time

Showing 1–18 of 18 patents

Patent #TitleCo-InventorsDate
7489394 Apparatus for inspecting a disk-like object Thomas Krieg 2009-02-10
7242467 Method and apparatus for high-resolution defect location and classification 2007-07-10
7152488 System operating unit Roland Hedrich, Karsten Urban 2006-12-26
7084965 Arrangement and method for inspecting unpatterned wafers Kuno Backhaus 2006-08-01
7041952 Method for automatic focusing an imaging optical system on the surface of a sample Thomas Iffland, Gert Weniger 2006-05-09
7002740 Setting module for the illumination of an optical instrument Michael Veith, Uwe Graf 2006-02-21
6985237 Method for determining layer thickness ranges Hakon Mikkelsen 2006-01-10
6962471 Substrate conveying module and system made up of substrate conveying module and workstation Andreas Birkner, Knut Hiltawski, Karsten Urban 2005-11-08
6941009 Method for evaluating pattern defects on a water surface 2005-09-06
6920249 Method and measuring instrument for determining the position of an edge of a pattern element on a substrate Klaus Rinn, Wolfgang Fricke 2005-07-19
6918735 Holding device for wafers Karsten Urban, Winfried Deutscher 2005-07-19
6826511 Method and apparatus for the determination of layer thicknesses Hakon Mikkelsen, Horst Engel 2004-11-30
6713746 Arrangement and method for illuminating a specimen field in an optical instrument Michael Veith, Uwe Graf 2004-03-30
6696679 Method for focusing of disk-shaped objects with patterned surfaces during imaging Michael A. Graef, Uwe Graf, Guenter Hoffmann, Karl-Heinz Franke, Lutz Jakob 2004-02-24
6618154 Optical measurement arrangement, in particular for layer thickness measurement Horst Engel, Hakon Mikkelsen, Lambert Danner, Matthias Slodowski, Kuno Backhaus 2003-09-09
6504608 Optical measurement arrangement and method for inclination measurement Klaus Hallmeyer, Guenter Hoffmann 2003-01-07
6456373 Method and apparatus for monitoring the light emitted from an illumination apparatus for an optical measuring instrument Kuno Backhaus, Detlef Wolter, Matthias Slodowski, Horst-Dieter Jaritz 2002-09-24
6075880 Method for detection of defects in the inspection of structured surfaces Dietmar Kollhof, Karl-Heinz Franke, Michael A. Graef, Heiko-Ulrich Klaus Kempe 2000-06-13