Issued Patents All Time
Showing 151–173 of 173 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6817903 | Process for reducing leakage in an integrated circuit with shallow trench isolated active areas | Kaichiu Wong, Venuka Jayatilaka | 2004-11-16 |
| 6818558 | Method of manufacturing a dielectric layer for a silicon-oxide-nitride-oxide-silicon (SONOS) type devices | Manuj Rathor, Fred Jenne, Loren T. Lancaster | 2004-11-16 |
| 6803330 | Method for growing ultra thin nitrided oxide | Sundar Narayanan | 2004-10-12 |
| 6803321 | Nitride spacer formation | Alain Blosse, Sundar Narayanan | 2004-10-12 |
| 6794269 | Method for and structure formed from fabricating a relatively deep isolation structure | Prabhuram Gopalan, Biju Parameshwaran, Hanna Bamnolker, Sundar Narayanan | 2004-09-21 |
| 6777307 | Method of forming semiconductor structures with reduced step heights | Steven Hedayati | 2004-08-17 |
| 6773975 | Formation of a shallow trench isolation structure in integrated circuits | Sundar Narayanan, Shahin Sharifzadeh | 2004-08-10 |
| 6774033 | Metal stack for local interconnect layer | Mira Ben-Tzur, Dafna Beery, Gorley Lau | 2004-08-10 |
| 6774452 | Semiconductor structure having alignment marks with shallow trench isolation | Sharmin Sadoughi | 2004-08-10 |
| 6680516 | Controlled thickness gate stack | Alain Blosse | 2004-01-20 |
| 6677213 | SONOS structure including a deuterated oxide-silicon interface and method for making the same | Frederick B. Jenne | 2004-01-13 |
| 6664120 | Method and structure for determining a concentration profile of an impurity within a semiconductor layer | Sundar Narayanan | 2003-12-16 |
| 6660661 | Integrated circuit with improved RC delay | Mira Ben-Tzur, Alain Blosse, Fuad Badrieh | 2003-12-09 |
| 6624052 | Process for annealing semiconductors and/or integrated circuits | Manuj Rathor | 2003-09-23 |
| 6555484 | Method for controlling the oxidation of implanted silicon | Hanna Bamnolker | 2003-04-29 |
| 6534378 | Method for forming an integrated circuit device | Chidambaram G. Kallingal, Sriram Madhavan | 2003-03-18 |
| 6436848 | Method for forming nitrogen-rich silicon oxide-based dielectric materials | — | 2002-08-20 |
| 6436799 | Process for annealing semiconductors and/or integrated circuits | Manuj Rathor | 2002-08-20 |
| 6399462 | Method and structure for isolating integrated circuit components and/or semiconductor active devices | Sang Sig KIM, Sharmin Sadoughi, Pamela Trammel, Avner Shelem | 2002-06-04 |
| 6171180 | Planarizing a trench dielectric having an upper surface within a trench spaced below an adjacent polish stop surface | William Koutny, Chidambaram G. Kallingal | 2001-01-09 |
| 6033991 | Isolation scheme based on recessed locos using a sloped Si etch and dry field oxidation | Pamela Trammel, Sharmin Sadoughi | 2000-03-07 |
| 6004399 | Ultra-low particle semiconductor cleaner for removal of particle contamination and residues from surface oxide formation on semiconductor wafers | Kaichiu Wong, Hanna Bamnolker, Suraj Puri, Rajiv Bhushan, David Wong +2 more | 1999-12-21 |
| 5830804 | Encapsulated dielectric and method of fabrication | James M. Cleeves | 1998-11-03 |