Issued Patents All Time
Showing 1–13 of 13 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12293895 | Charged particle beam system, method of operating a charged particle beam system, method of recording a plurality of images and computer programs for executing the methods | Amir Avishai, Thomas Korb, Daniel Fischer | 2025-05-06 |
| 12288706 | Parameterizing x-ray scattering measurement using slice-and-image tomographic imaging of semiconductor structures | Hans-Michael Stiepan, Thomas Korb, Alex Buxbaum, Dmitry Klochkov, Jens Timo Neumann | 2025-04-29 |
| 12288705 | FIB-SEM 3D tomography for measuring shape deviations of HAR structures | Amir Avishai, Alex Buxbaum, Dmitry Klochkov, Thomas Korb, Keumsil Lee | 2025-04-29 |
| 12283504 | Contact area size determination between 3D structures in an integrated semiconductor sample | Alex Buxbaum, Amir Avishai, Dmitry Klochkov, Thomas Korb, Keumsil Lee | 2025-04-22 |
| 12045969 | Automated root cause analysis for defect detection during fabrication processes of semiconductor structures | Jens Timo Neumann, Ramani Pichumani, Abhilash Srikantha, Christian Wojek, Thomas Korb +1 more | 2024-07-23 |
| 11915908 | Method for measuring a sample and microscope implementing the method | Amir Avishai, Dmitry Klochkov, Thomas Korb, Jens Timo Neumann, Keumsil Lee | 2024-02-27 |
| 11810749 | Charged particle beam system, method of operating a charged particle beam system, method of recording a plurality of images and computer programs for executing the methods | Amir Avishai, Thomas Korb, Daniel Fischer | 2023-11-07 |
| 11436506 | Method and devices for determining metrology sites | Abhilash Srikantha, Christian Wojek, Keumsil Lee, Thomas Korb, Jens Timo Neumann | 2022-09-06 |
| 10599052 | Vacuum system, in particular EUV lithography system, and optical element | Matthias Roos | 2020-03-24 |
| 10585356 | Projection exposure apparatus and method for measuring a projection lens | Frank Leonard Schadt, III, Uwe Hempelmann, Frank Schleicher | 2020-03-10 |
| 10241421 | Vacuum system, in particular EUV lithography system, and optical element | Matthias Roos | 2019-03-26 |
| 9952519 | Vacuum linear feed-through and vacuum system having said vacuum linear feed-through | Matthias Roos | 2018-04-24 |
| 8257888 | Particle beam writing method, particle beam writing apparatus and maintenance method for same | Martin Sczyrba, Christian Buergel | 2012-09-04 |