FI

Frank Leonard Schadt, III

EA E.I. Du Pont De Nemours And: 38 patents #77 of 8,010Top 1%
CG Carl Zeiss Smt Gmbh: 1 patents #657 of 1,189Top 60%
CL Cda Processing Limited Liability: 1 patents #5 of 19Top 30%
📍 Wilmington, DE: #60 of 3,182 inventorsTop 2%
🗺 Delaware: #124 of 7,163 inventorsTop 2%
Overall (All Time): #73,446 of 4,157,543Top 2%
42
Patents All Time

Issued Patents All Time

Showing 1–25 of 42 patents

Patent #TitleCo-InventorsDate
10585356 Projection exposure apparatus and method for measuring a projection lens Eugen Foca, Uwe Hempelmann, Frank Schleicher 2020-03-10
9312485 Process and materials for making contained layers and devices made with same Adam Fennimore, Denis Y. Kondakov, Steve Mackara 2016-04-12
8652998 Branched copolymer/anthranilic diamide compositions for propagule coating Wilson Tam 2014-02-18
8431491 Method for membrane protection during reactive ion/plasma etching processing for via or cavity formation in semiconductor manufacture Chester E. Balut, Stephen E. Vargo 2013-04-30
8270145 Screen-printable encapsulants based on soluble polybenzoxazoles Thomas E. Dueber, John D. Summers 2012-09-18
8048604 Hydrofluoroalkanesulfonic acids and salts from fluorovinyl ethers Christopher P. Junk, Mark Andrew Harmer, Andrew Edward Feiring, Zoe Schnepp 2011-11-01
7834113 Photoresist compositions and processes for preparing the same James R. Sounik, Michael Fryd 2010-11-16
7834209 Hydrofluoroalkanesulfonic acids from fluorovinyl ethers Christopher P. Junk, Mark Andrew Harmer, Andrew Edward Feiring, Zoe Schnepp 2010-11-16
7696292 Low-polydispersity photoimageable acrylic polymers, photoresists and processes for microlithography William B. Farnham, Michael Fryd 2010-04-13
7507522 Photoresists comprising polymers derived from fluoroalcohol-substituted polycyclic monomers Michael Karl Crawford, Hoang Vi Tran, Fredrick Claus Zumsteg, Jr., Andrew Edward Feiring, Michael Fryd 2009-03-24
7408013 Low-polydispersity photoimageable polymers and photoresists and processes for microlithography Andrew Edward Feiring, Michael Fryd 2008-08-05
7326796 Fluorinated monomers, fluorinated polymers having polycyclic groups with fused 4-membered heterocyclic rings, useful as photoresists, and processes for microlithography Andrew Edward Feiring, Viacheslav A. Petrov, Bruce E. Smart, William B. Farnham 2008-02-05
7312287 Fluorinated polymers useful as photoresists, and processes for microlithography Andrew Edward Feiring, William B. Farnham, Jerald Feldman 2007-12-25
7264914 Fluorinated polymers having polycyclic groups with fused 4-membered carbocyclic rings, useful as photoresists, and processes for microlithography Andrew Edward Feiring, Viacheslav A. Petrov, Bruce E. Smart, William B. Farnham 2007-09-04
7261993 Photoresists and processes for microlithography Michael Fryd, Mookkan Periyasamy 2007-08-28
7217495 Fluorinated polymers, photoresists and processes for microlithography Andrew Edward Feiring, Jerald Feldman 2007-05-15
7205086 Multilayer elements containing photoresist compositions and their use in microlithography Larry Berger 2007-04-17
7166416 Protecting groups in polymers, photoresists and processes for microlithography Andrew Edward Feiring, Viacheslav A. Petrov 2007-01-23
7108953 Dissolution inhibitors in photoresist compositions for microlithography Larry Berger, Jerald Feldman, Viacheslav A. Petrov, Andrew Edward Feiring, Fredrick Claus Zumsteg, Jr. 2006-09-19
7045268 Polymers blends and their use in photoresist compositions for microlithography Larry Berger 2006-05-16
7022457 Photoresists with hydroxylated, photoacid-cleavable groups William B. Farnham, Andrew Edward Feiring, Weiming Qiu 2006-04-04
7019092 Fluorinated copolymers for microlithography Andrew Edward Feiring, Gary N. Taylor 2006-03-28
6974657 Compositions for microlithography Larry Berger, Michael Karl Crawford, Jerald Feldman, Lynda Kaye Johnson, Fredrick Claus Zumsteg, Jr. 2005-12-13
6951705 Polymers for photoresist compositions for microlithography Michael Fryd, Periyasamy Mookkan 2005-10-04
6899995 Protecting groups in polymers, photoresists and processes for microlithography Andrew Edward Feiring, Viacheslav A. Petrov 2005-05-31