Issued Patents All Time
Showing 1–25 of 84 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12370502 | Carbon dioxide separation membranes and process | Ning Shangguan, Stuart M. Nemser, Sudipto Majumdar | 2025-07-29 |
| 11905350 | Gas permeable fluoropolymers and ionomers | Robert Daniel Lousenberg | 2024-02-20 |
| 11851602 | Epoxide and fluorinated epoxide stabilizers for fluoroolefins | Viacheslav A. Petrov, Barbara Haviland Minor, Mario Joseph Nappa, Nandini C. Mouli, Thomas J. Leck +1 more | 2023-12-26 |
| 11130894 | Epoxide and fluorinated epoxide stabilizers for fluoroolefins | Viacheslav A. Petrov, Barbara Haviland Minor, Mario Joseph Nappa, Nandini C. Mouli, Thomas J. Leck +1 more | 2021-09-28 |
| 10596527 | Amorphous fluorinated copolymer gas separation membranes | Ning Shangguan, Sudipto Majumdar | 2020-03-24 |
| 10550302 | Epoxide and fluorinated epoxide stabilizers for fluoroolefins | Viacheslav A. Petrov, Barbara Haviland Minor, Mario Joseph Nappa, Nandini C. Mouli, Thomas J. Leck +1 more | 2020-02-04 |
| 10399044 | Thin film composite membranes for separation of alkenes from alkanes | Sudipto Majumdar, Ning Shangguan, Yosuke Koizumi | 2019-09-03 |
| 10029248 | Membrane separation of olefin and paraffin mixtures | Jonathan Lazzeri, Sudipto Majumdar, Ning Shangguan | 2018-07-24 |
| 9777204 | Epoxide and fluorinated epoxide stabilizers for fluoroolefins | Viacheslav A. Petrov, Barbara Haviland Minor, Mario Joseph Nappa, Nandini C. Mouli, Thomas J. Leck +1 more | 2017-10-03 |
| 9463450 | Polymeric acid catalysis | Ning Shangguan, Ashokkumar B. Shenvi | 2016-10-11 |
| 9133381 | Epoxide and fluorinated epoxide stabilizers for fluoroolefins | Viacheslav A. Petrov, Barbara Haviland Minor, Mario Joseph Nappa, Nandini C. Mouli, Thomas J. Leck +1 more | 2015-09-15 |
| 9120834 | Membrane separation of ionic liquid solutions | Daniel Campos, Sudipto Majumdar, Stuart M. Nemser | 2015-09-01 |
| 8663494 | Terpene, terpenoid, and fullerene stabilizers for fluoroolefins | Jon Lee Howell, Velliyur Nott Mallikarjuna Rao, Thomas J. Leck, Barbara Haviland Minor, Mario Joseph Nappa +2 more | 2014-03-04 |
| 8614347 | Fluorous dendrimers and methods for production thereof | Virgil Percec, Christopher J. Wilson, Daniela A. Wilson | 2013-12-24 |
| 8568616 | Electrically conductive polymer compositions | Che-Hsiung Hsu, Christopher P. Junk, Frank P. Uckert, Mark F. Teasley, Charles J. Dubois +3 more | 2013-10-29 |
| 8535556 | Compositions comprising iodotrifluoromethane and stabilizers | Thomas J. Leck, Nandini C. Mouli, Jon Lee Howell, Velliyur Nott Mallikarjuna Rao, Viacheslav A. Petrov +6 more | 2013-09-17 |
| 8535555 | Epoxide and fluorinated epoxide stabilizers for fluoroolefins | Viacheslav A. Petrov, Barbara Haviland Minor, Mario Joseph Nappa, Nandini C. Mouli, Thomas J. Leck +1 more | 2013-09-17 |
| 8101094 | Terpene, terpenoid, and fullerene stabilizers for fluoroolefins | Jon Lee Howell, Velliyur Nott Mallikarjuna Rao, Thomas J. Leck, Barbara Haviland Minor, Mario Joseph Nappa +2 more | 2012-01-24 |
| 8048604 | Hydrofluoroalkanesulfonic acids and salts from fluorovinyl ethers | Christopher P. Junk, Mark Andrew Harmer, Frank Leonard Schadt, III, Zoe Schnepp | 2011-11-01 |
| 7834209 | Hydrofluoroalkanesulfonic acids from fluorovinyl ethers | Christopher P. Junk, Mark Andrew Harmer, Frank Leonard Schadt, III, Zoe Schnepp | 2010-11-16 |
| 7737307 | Fluorinated nonionic surfactants | Peter Michael Murphy, Stephan James McLain, Jessica Sinks | 2010-06-15 |
| 7722785 | Electrically conductive polymer compositions | Che-Hsiung Hsu, Sunghan Kim, Charles J. Dubois, Christopher P. Junk, Zhen-Yu Yang +2 more | 2010-05-25 |
| 7507522 | Photoresists comprising polymers derived from fluoroalcohol-substituted polycyclic monomers | Michael Karl Crawford, Hoang Vi Tran, Frank Leonard Schadt, III, Fredrick Claus Zumsteg, Jr., Michael Fryd | 2009-03-24 |
| 7408011 | Photoresists, fluoropolymers and processes for 157 nm microlithography | Viacheslav A. Petrov, Bruce E. Smart | 2008-08-05 |
| 7408013 | Low-polydispersity photoimageable polymers and photoresists and processes for microlithography | Michael Fryd, Frank Leonard Schadt, III | 2008-08-05 |