Issued Patents All Time
Showing 26–38 of 38 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10151576 | Confocally chromatic sensor for determining coordinates of a measurement object | Christoph Husemann | 2018-12-11 |
| 10120163 | Auto-focus method for a coordinate-measuring apparatus | Dominik Seitz, Christoph Kranz | 2018-11-06 |
| 10088754 | Illumination system for microlithography | Axel Scholz, Frank Schlesener, Vladimir Davydenko, Michael Gerhard, Gerhard-Wilhelm Ziegler +8 more | 2018-10-02 |
| 10067028 | Calibration structure and calibration method for calibrating optical measuring devices | Dominik Seitz | 2018-09-04 |
| 9990724 | Image recording simulation in a coordinate measuring machine | Thomas Engel, Michael Louis Wick, Hans-Joachim Frasch | 2018-06-05 |
| 9939261 | Method and device for calibrating an imaging optical unit for metrological applications | Thomas Engel, Dominik Seitz, Daniel Plohmann | 2018-04-10 |
| 9857164 | Lens device for a variable working distance, illumination assembly, coordinate measuring machine and method | Dominik Seitz | 2018-01-02 |
| 9846026 | Light-emitting table suitable for use in metrology, and coordinate measuring machine having such a light-emitting table | — | 2017-12-19 |
| 9606441 | Illumination system for microlithography | Axel Scholz, Frank Schlesener, Vladimir Davydenko, Michael Gerhard, Gerhard-Wilhelm Ziegler +8 more | 2017-03-28 |
| 9280060 | Illumination system for microlithography | Axel Scholz, Frank Schlesener, Vladimir Davydenko, Michael Gerhard, Gerhard-Wilhelm Ziegler +8 more | 2016-03-08 |
| 8873023 | Illumination system for microlithography | Axel Scholz, Frank Schlesener, Vladimir Davydenko, Michael Gerhard, Gerhard-Wilhelm Ziegler +8 more | 2014-10-28 |
| 8520307 | Optical integrator for an illumination system of a microlithographic projection exposure apparatus | Oliver Wolf, Heiko Siekmann, Eva Kalchbrenner, Siegfried Rennon, Johannes Wangler +6 more | 2013-08-27 |
| 7880969 | Optical integrator for an illumination system of a microlithographic projection exposure apparatus | Oliver Wolf, Heiko Siekmann, Eva Kalchbrenner, Siegfried Rennon, Johannes Wangler +6 more | 2011-02-01 |