NT

Naoto Tsuji

AB Asm Ip Holding B.V.: 21 patents #37 of 620Top 6%
AK Asm Japan K.K.: 13 patents #8 of 128Top 7%
DI Daikin Industries: 1 patents #1,764 of 2,957Top 60%
FC Fuji Electric Co.: 1 patents #1,354 of 2,643Top 55%
HE Hitachi Kokusai Electric: 1 patents #493 of 843Top 60%
KC Kanto Denka Kogyo Co.: 1 patents #61 of 140Top 45%
Mitsubishi Electric: 1 patents #15,491 of 25,717Top 65%
NE Nec Electronics: 1 patents #715 of 1,789Top 40%
RT Renesas Technology: 1 patents #1,991 of 3,337Top 60%
SC Sanyo Electric Co.: 1 patents #3,644 of 6,347Top 60%
Sumitomo Electric Industries: 1 patents #13,249 of 21,551Top 65%
TL Tokyo Electron Limited: 1 patents #3,538 of 5,567Top 65%
UL Ulvac: 1 patents #339 of 680Top 50%
AN Anelva: 1 patents #135 of 280Top 50%
SO Sony: 1 patents #17,262 of 25,231Top 70%
DC Daido Kogyo Co.: 1 patents #34 of 94Top 40%
Overall (All Time): #88,882 of 4,157,543Top 3%
37
Patents All Time

Issued Patents All Time

Showing 26–37 of 37 patents

Patent #TitleCo-InventorsDate
7718544 Method of forming silicon-containing insulation film having low dielectric constant and low diffusion coefficient Kiyohiro Matsushita, Satoshi Takahashi, Nathan Kameling 2010-05-18
7641761 Apparatus and method for forming thin film using surface-treated shower plate Yukihiro Mori, Tominori Yoshida, Masami Suzuki 2010-01-05
7418921 Plasma CVD apparatus for forming uniform film Satoshi Takahashi 2008-09-02
7147900 Method for forming silicon-containing insulation film having low dielectric constant treated with electron beam radiation Atsuki Fukazawa, Nobuo Matsuki, Shingo Ikeda 2006-12-12
7098129 Interlayer insulation film used for multilayer interconnect of semiconductor integrated circuit and method of manufacturing the same Fumitoshi Ozaki, Satoshi Takahashi 2006-08-29
7037855 Method of forming fluorine-doped low-dielectric-constant insulating film Yozo Ikedo, Ryu Nakano, Shuzo Hebiguchi 2006-05-02
7012268 Gas-shield electron-beam gun for thin-film curing application Nobuo Matsuki, Atsuki Fukazawa 2006-03-14
6935351 Method of cleaning CVD device and cleaning device therefor Koji Shibata, Hitoshi Murata, Etsuo Wani, Yoshihide Kosano 2005-08-30
6905978 Method of forming interlayer insulation film Yukihiro Mori, Satoshi Takahashi, Ryo Kawaguchi 2005-06-14
6818570 Method of forming silicon-containing insulation film having low dielectric constant and high mechanical strength Yukihiro Mori, Satoshi Takahashi, Kiyohiro Matsushita, Atsuki Fukazawa, Michael A. Todd 2004-11-16
6740602 Method of forming low-dielectric constant film on semiconductor substrate by plasma reaction using high-RF power Menso Hendriks, Satoshi Takahashi 2004-05-25
5626679 Method and apparatus for preparing a silicon oxide film Akio Shimizu 1997-05-06