Issued Patents All Time
Showing 26–31 of 31 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6416823 | Deposition chamber and method for depositing low dielectric constant films | Shijian Li, Fred C. Redeker, Tetsuya Ishikawa, Alan W. Collins | 2002-07-09 |
| 6413871 | Nitrogen treatment of polished halogen-doped silicon glass | Hichem M'Saad, Derek R. Witty, Manoj Vellaikal, Lin Zhang | 2002-07-02 |
| 6383954 | Process gas distribution for forming stable fluorine-doped silicate glass and other films | Diana Chan, Turgut Sahin, Tetsuya Ishikawa, Farhad Moghadam | 2002-05-07 |
| 6323119 | CVD deposition method to improve adhesion of F-containing dielectric metal lines for VLSI application | Ming Xi, Turgut Sahin | 2001-11-27 |
| 6211065 | Method of depositing and amorphous fluorocarbon film using HDP-CVD | Ming Xi, Eugene Tzou, LIE CHENG, Turgut Sahin | 2001-04-03 |
| 6070551 | Deposition chamber and method for depositing low dielectric constant films | Shijian Li, Fred C. Redeker, Tetsuya Ishikawa, Alan W. Collins | 2000-06-06 |