Issued Patents All Time
Showing 26–50 of 65 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9138578 | Endovascular catheters with tuned control members and associated systems and methods | Andrew Wu | 2015-09-22 |
| 9044575 | Catheters with enhanced flexibility and associated devices, systems, and methods | Rudy Beasley, Justin Goshgarian | 2015-06-02 |
| 8721680 | Apparatus and methods for sealing a vascular puncture | Ronald Hundertmark, Andy H. Uchida, Moshe Zilversmit, David L. Fiscella, Brandon Fell | 2014-05-13 |
| 8668776 | Gas delivery apparatus and method for atomic layer deposition | Ling Chen, Dien-Yeh Wu, Hua Chung, Alan Ouye, Norman Nakashima | 2014-03-11 |
| 8070879 | Apparatus and method for hybrid chemical processing | Ling Chen, Mei Chang, Dien-Yeh Wu, Hua Chung | 2011-12-06 |
| 8062422 | Method and apparatus for generating a precursor for a semiconductor processing system | Ling Chen, Hua Chung, Christophe Marcadal, Seshadri Ganguli, Jenny Lin +3 more | 2011-11-22 |
| 7867896 | Sequential deposition of tantalum nitride using a tantalum-containing precursor and a nitrogen-containing precursor | Wei Cao, Hua Chung, Ling Chen | 2011-01-11 |
| 7780785 | Gas delivery apparatus for atomic layer deposition | Ling Chen, Dien-Yeh Wu, Hua Chung, Alan Ouye, Norman Nakashima +1 more | 2010-08-24 |
| 7780788 | Gas delivery apparatus for atomic layer deposition | Ling Chen, Dien-Yeh Wu, Hua Chung, Alan Ouye, Norman Nakashima | 2010-08-24 |
| 7699023 | Gas delivery apparatus for atomic layer deposition | Ling Chen, Dien-Yeh Wu, Hua Chung, Alan Ouye, Norman Nakashima +1 more | 2010-04-20 |
| 7678194 | Method for providing gas to a processing chamber | Seshadri Ganguli, Ling Chen | 2010-03-16 |
| 7597758 | Chemical precursor ampoule for vapor deposition processes | Ling Chen, Hua Chung, Christophe Marcadal, Seshadri Ganguli, Jenny Lin +3 more | 2009-10-06 |
| 7591907 | Apparatus for hybrid chemical processing | Ling Chen, Mei Chang, Dien-Yeh Wu, Hua Chung | 2009-09-22 |
| 7588736 | Apparatus and method for generating a chemical precursor | Ling Chen, Hua Chung, Christophe Marcadal, Seshadri Ganguli, Jenny Lin +3 more | 2009-09-15 |
| 7569191 | Method and apparatus for providing precursor gas to a processing chamber | Seshadri Ganguli, Ling Chen | 2009-08-04 |
| 7524374 | Method and apparatus for generating a precursor for a semiconductor processing system | Ling Chen, Hua Chung, Christophe Marcadal, Seshadri Ganguli, Jenny Lin +3 more | 2009-04-28 |
| 7514358 | Sequential deposition of tantalum nitride using a tantalum-containing precursor and a nitrogen-containing precursor | Wei Cao, Hua Chung, Ling Chen | 2009-04-07 |
| 7429361 | Method and apparatus for providing precursor gas to a processing chamber | Seshadri Ganguli, Ling Chen | 2008-09-30 |
| 7422637 | Processing chamber configured for uniform gas flow | Ling Chen, Howard Grunes, Hua Chung | 2008-09-09 |
| 7402210 | Apparatus and method for hybrid chemical processing | Ling Chen, Mei Chang, Dien-Yeh Wu, Hua Chung | 2008-07-22 |
| 7270709 | Method and apparatus of generating PDMAT precursor | Ling Chen, Hua Chung, Christophe Marcadal, Seshadri Ganguli, Jenny Lin +3 more | 2007-09-18 |
| 7228873 | Valve design and configuration for fast delivery system | Ling Chen, Dien-Yeh Wu | 2007-06-12 |
| 7204886 | Apparatus and method for hybrid chemical processing | Ling Chen, Mei Chang, Dien-Yeh Wu, Hua Chung | 2007-04-17 |
| 7186385 | Apparatus for providing gas to a processing chamber | Seshadri Ganguli, Ling Chen | 2007-03-06 |
| 7066194 | Valve design and configuration for fast delivery system | Ling Chen, Dien-Yeh Wu | 2006-06-27 |