Issued Patents All Time
Showing 51–59 of 59 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8034180 | Method of cooling a wafer support at a uniform temperature in a capacitively coupled plasma reactor | Richard Fovell, Douglas A. Buchberger, Jr., Douglas H. Burns, Kallol Bera, Daniel J. Hoffman | 2011-10-11 |
| 8021521 | Method for agile workpiece temperature control in a plasma reactor using a thermal model | Douglas A. Buchberger, Jr., Richard Fovell, Hamid Tavassoli, Douglas H. Burns, Kallol Bera +5 more | 2011-09-20 |
| 8012304 | Plasma reactor with a multiple zone thermal control feed forward control apparatus | Richard Fovell, Hamid Tavassoli, Douglas A. Buchberger, Jr., Douglas H. Burns, Kallol Bera +1 more | 2011-09-06 |
| 7988872 | Method of operating a capacitively coupled plasma reactor with dual temperature control loops | Richard Fovell, Douglas A. Buchberger, Jr., Douglas H. Burns, Kallol Bera, Daniel J. Hoffman +4 more | 2011-08-02 |
| 7649729 | Electrostatic chuck assembly | Douglas A. Buchberger, Jr. | 2010-01-19 |
| 7540971 | Plasma etch process using polymerizing etch gases across a wafer surface and additional polymer managing or controlling gases in independently fed gas zones with time and spatial modulation of gas content | Kallol Bera, Xiaoye Zhao, Kenny L. Doan, Ezra Robert Gold, Bruno Geoffrion +2 more | 2009-06-02 |
| 7541292 | Plasma etch process with separately fed carbon-lean and carbon-rich polymerizing etch gases in independent inner and outer gas injection zones | Kallol Bera, Xiaoye Zhao, Kenny L. Doan, Ezra Robert Gold, Bruno Geoffrion +2 more | 2009-06-02 |
| 7431859 | Plasma etch process using polymerizing etch gases with different etch and polymer-deposition rates in different radial gas injection zones with time modulation | Kallol Bera, Xiaoye Zhao, Kenny L. Doan, Ezra Robert Gold, Bruno Geoffrion +2 more | 2008-10-07 |
| 6406522 | Dual mode air treatment apparatus and method | David H. McFadden | 2002-06-18 |