MM

Maitreyee Mahajani

Applied Materials: 27 patents #426 of 7,310Top 6%
S3 Sandisk 3D: 9 patents #48 of 180Top 30%
MS Matrix Semiconductor: 8 patents #18 of 55Top 35%
📍 Saratoga, CA: #194 of 2,933 inventorsTop 7%
🗺 California: #9,121 of 386,348 inventorsTop 3%
Overall (All Time): #63,342 of 4,157,543Top 2%
46
Patents All Time

Issued Patents All Time

Showing 26–46 of 46 patents

Patent #TitleCo-InventorsDate
7557405 High-density nonvolatile memory S. Brad Herner 2009-07-07
7508714 Memory array incorporating mirrored NAND strings and non-shared global bit lines within a block Luca Fasoli, Roy E. Scheuerlein, En-Hsing Chen, Sucheta Nallamothu, Andrew J. Walker 2009-03-24
7495337 Dual-gate device and method Andrew J. Walker 2009-02-24
7462521 Dual-gate device and method Andrew J. Walker 2008-12-09
7402534 Pretreatment processes within a batch ALD reactor 2008-07-22
7221588 Memory array incorporating memory cells arranged in NAND strings Luca Fasoli, Roy E. Scheuerlein, En-Hsing Chen, Sucheta Nallamothu, Andrew J. Walker 2007-05-22
7026212 Method for making high density nonvolatile memory S. Brad Herner 2006-04-11
7012299 Storage layer optimization of a nonvolatile memory device Andrew J. Walker, En-Hsing Chen 2006-03-14
7009275 Method for making high density nonvolatile memory S. Brad Herner 2006-03-07
6995422 High-density three-dimensional memory S. Brad Herner 2006-02-07
6984561 Method for making high density nonvolatile memory S. Brad Herner 2006-01-10
6960794 Formation of thin channels for TFT devices to ensure low variability of threshold voltages Andrew J. Walker, S. Brad Herner, En-Hsing Chen, Roy E. Scheuerlein, Sucheta Nallamothu +1 more 2005-11-01
6952030 High-density three-dimensional memory cell S. Brad Herner 2005-10-04
6858899 Thin film transistor with metal oxide layer and method of making same Andrew J. Walker 2005-02-22
6464795 Substrate support member for a processing chamber Semyon Sherstinsky, Calvin Augason, Leonel A. Zuniga, Jun Zhao, Talex Sajoto +5 more 2002-10-15
6328808 Apparatus and method for aligning and controlling edge deposition on a substrate Kenneth Tsai, Joseph Yudovsky, Steve Ghanayem, Ken Kaung Lai, Patricia M. Liu +1 more 2001-12-11
6271129 Method for forming a gap filling refractory metal layer having reduced stress Steve Ghanayem 2001-08-07
6186092 Apparatus and method for aligning and controlling edge deposition on a substrate Kenneth Tsai, Joseph Yudovsky, Steve Ghanayem, Ken Kaung Lai, Patricia M. Liu +1 more 2001-02-13
6174373 Non-plasma halogenated gas flow prevent metal residues Steve Ghanayem, Moris Kori, Ravi Rajagopalan 2001-01-16
6070599 Non-plasma halogenated gas flow to prevent metal residues Steve Ghanayem, Moris Kori, Ravi Rajagopalan 2000-06-06
5709772 Non-plasma halogenated gas flow to prevent metal residues Steve Ghanayem, Moris Kori, Ravi Rajagopalan 1998-01-20