Issued Patents All Time
Showing 26–50 of 58 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7623334 | Electrostatic chuck device | Masahito Ishihara, Sunil Wickramanayaka, Naoki Miyazaki | 2009-11-24 |
| 6974721 | Method for manufacturing thin semiconductor chip | Naoyuki Koizumi, Kei Murayama, Takashi Kurihara | 2005-12-13 |
| 6872289 | Thin film fabrication method and thin film fabrication apparatus | Makoto Satou, Manabu Tagami, Hideki Satou | 2005-03-29 |
| 6849945 | Multi-layered semiconductor device and method for producing the same | Michio Horiuchi, Takashi Kurihara | 2005-02-01 |
| 6844661 | Piezoelectric ceramic composition and piezoelectric actuator for ink-jet head based on use of the same | — | 2005-01-18 |
| 6774467 | Semiconductor device and process of production of same | Michio Horiuchi, Takashi Kurihara, Tomio Nagaoka, Masao Aoki | 2004-08-10 |
| 6663714 | CVD apparatus | Hiroshi Doi, Seiji Itani, Xiao-Meng Liu | 2003-12-16 |
| 6518672 | Multi-layer wiring board substrate and semiconductor device using the multi-layer wiring substrate | Takashi Kurihara, Michio Horiuchi, Yuka Tamadate | 2003-02-11 |
| 6455786 | Wiring board and manufacturing method thereof and semiconductor device | Michio Horiuchi, Shigetsugu Muramatsu, Takashi Kurihara | 2002-09-24 |
| 6407460 | Multilayer circuit board | Michio Horiuchi | 2002-06-18 |
| 6348238 | Thin film fabrication method and thin film fabrication apparatus | Makoto Satou, Manabu Tagami, Hideki Satou | 2002-02-19 |
| 6199505 | Plasma processing apparatus | Hisaaki Sato, Tsutomu Tsukada, Nobuaki Tsuchiya | 2001-03-13 |
| 6129046 | Substrate processing apparatus | Masahito Ishihara, Kazuhito Watanabe, Nobuyuki Takahashi | 2000-10-10 |
| 6103304 | Chemical vapor deposition apparatus | — | 2000-08-15 |
| 6085690 | Chemical vapor deposition apparatus | — | 2000-07-11 |
| 6070552 | Substrate processing apparatus | Masahito Ishihara, Yoichiro Numasawa, Nobuyuki Takahashi | 2000-06-06 |
| 6059985 | Method of processing a substrate and apparatus for the method | Takanori Yoshimura, Shinya Hasegawa, Yoichiro Numasawa, Nobuyuki Takahashi | 2000-05-09 |
| 5956616 | Method of depositing thin films by plasma-enhanced chemical vapor deposition | Manabu Tagami, Shinya Hasegawa, Yoichiro Numasawa, Masahito Ishihara, Kiyoshi Nashimoto +1 more | 1999-09-21 |
| 5893962 | Electrode unit for in-situ cleaning in thermal CVD apparatus | Manabu Tagami, Takanori Yoshimura | 1999-04-13 |
| 5840366 | Method of forming thin film | Akihiko Koura | 1998-11-24 |
| 5766363 | Heater for CVD apparatus | Kazuhito Watanabe, Takanori Yoshimura, Nobuyuki Takahashi | 1998-06-16 |
| 5728629 | Process for preventing deposition on inner surfaces of CVD reactor | Takanori Yoshimura, Yoshihiro Katsumata, Nobuyoki Takahashi | 1998-03-17 |
| 5676758 | CVD apparatus | Shinya Hasegawa, Kazuhito Watanabe, Nobuyuki Takahashi, Manabu Tagami, Takanori Yoshimura +1 more | 1997-10-14 |
| 5624499 | CVD apparatus | Masahito Ishihara, Manabu Tagami, Hajime Sahase, Nobuyuki Takahashi | 1997-04-29 |
| 5534072 | Integrated module multi-chamber CVD processing system and its method for processing subtrates | Yoshihiro Katsumata, Nobuyuki Takahashi | 1996-07-09 |