Issued Patents All Time
Showing 126–150 of 212 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6432261 | Plasma etching system | Kazuhito Watanabe, Hironari Shimizu, Toshiaki Koguchi | 2002-08-13 |
| 6412969 | Backlighting device and a method of manufacturing the same, and a liquid crystal display apparatus | Hiroshi Torihara, Kenichi Ukai | 2002-07-02 |
| 6386511 | Gate valve apparatus | Kazuhito Watanabe, Yoshihiro Katsumata | 2002-05-14 |
| 6382895 | Substrate processing apparatus | Akio Konishi | 2002-05-07 |
| 6361667 | Ionization sputtering apparatus | Masahiko Kobayashi, Hajime Sahase | 2002-03-26 |
| 6254244 | Luminaire and display using the same | Kenichi Ukai, Eiichi Shitamori | 2001-07-03 |
| 6200432 | Method of handling a substrate after sputtering and sputtering apparatus | Masahiko Kobayashi | 2001-03-13 |
| 6146533 | Method of treating wastewater containing chemical substances by use of supercritical fluid and treating apparatus | Toshihiro Nakai, Yoshio Sato, Yoshishige Kato | 2000-11-14 |
| 6129046 | Substrate processing apparatus | Shigeru Mizuno, Masahito Ishihara, Kazuhito Watanabe | 2000-10-10 |
| 6123766 | Method and apparatus for achieving temperature uniformity of a substrate | Meredith J. Williams, David S. Ballance, Benjamin Bierman, Paul Deaton, Brian Haas +1 more | 2000-09-26 |
| D430066 | Automobile | Shuji Koman | 2000-08-29 |
| 6077403 | Sputtering device and sputtering method | Masahiko Kobayashi | 2000-06-20 |
| 6070552 | Substrate processing apparatus | Shigeru Mizuno, Masahito Ishihara, Yoichiro Numasawa | 2000-06-06 |
| 6066920 | Illumination device, method for driving the illumination device and display including the illumination device | Hiroshi Torihara, Takayoshi Tanabe, Kenichi Ukai | 2000-05-23 |
| 6059985 | Method of processing a substrate and apparatus for the method | Takanori Yoshimura, Shigeru Mizuno, Shinya Hasegawa, Yoichiro Numasawa | 2000-05-09 |
| 6045672 | Sputtering apparatus | Masahiko Kobayashi | 2000-04-04 |
| 6030510 | Hot reflow sputtering method and apparatus | Masahiko Kobayashi | 2000-02-29 |
| 6022461 | Sputtering apparatus | Masahiko Kobayashi | 2000-02-08 |
| 6016765 | Plasma processing apparatus | Yoichiro Numasawa, Shinya Hasegawa, Tsutomu Tsukada | 2000-01-25 |
| 6013362 | Soundproof material | Manabu Matsunaga, Kazumasa Tanaka, Yasunori Sugihara | 2000-01-11 |
| 6013162 | Method of handling a substrate after sputtering and sputtering apparatus | Masahiko Kobayashi | 2000-01-11 |
| 5968327 | Ionizing sputter device using a coil shield | Masahiko Kobayashi | 1999-10-19 |
| 5956616 | Method of depositing thin films by plasma-enhanced chemical vapor deposition | Shigeru Mizuno, Manabu Tagami, Shinya Hasegawa, Yoichiro Numasawa, Masahito Ishihara +1 more | 1999-09-21 |
| 5944968 | Sputtering apparatus | Masahiko Kobayashi, Masahito Ishihara, Hajime Sahase | 1999-08-31 |
| 5925227 | Multichamber sputtering apparatus | Masahiko Kobayashi, Masahito Ishihara | 1999-07-20 |