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Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
YH

Yuesong He — 15 Patents

AMD: 13 patents #950 of 9,280Top 15%
BLBeijing Qihoo Techology Company Limited: 2 patents #43 of 230Top 20%
FLFujitsu Amd Semiconductor Limited: 1 patents #14 of 40Top 35%
Fujitsu Limited: 1 patents #14,843 of 24,456Top 65%
Overall (All Time): #307,048 of 4,157,543Top 8%
15 Patents All Time
Yuesong He has been granted 15 US patents while listed as an inventor at AMD. The first was granted in 1999 and the most recent in February 2019. Yuesong He ranks #307,048 of 4,157,543 US inventors in our database (top 7.4%). Patent records list Yuesong He in Beijing, CA, CN.

Patents per Year

Patents granted per year, 1999 to 2019Bar chart with a peak of 5 patents in 2000.peak 51999: 2 patents19992000: 5 patents20002001: 4 patents20012002: 1 patents20022004: 1 patents20042016: 1 patents20162019: 1 patents2019

Issued Patents All Time

Showing 1–15 of 15 patents

Patent #TitleCo-InventorsDateApprox Value ⓘ
10218767 Method, system and browser for executing active object of browser Jinwei Li, Zhi Chen, Yu Fu, Ming-Chung Li, Huan Ren 2019-02-26
9513937 Method and client for using an embedded ActiveX plug-in in a browser Zhi Chen, Jinwei Li, Yu Fu, Huan Ren 2016-12-06
6812521 Method and apparatus for improved performance of flash memory cell devices Kent Kuohua Chang, R. Lee Tan 2004-11-02 $2,431,000
6355522 Effect of doped amorphous Si thickness on better poly 1 contact resistance performance for nand type flash memory devices Kent Kuohua Chang, John Jianshi Wang 2002-03-12 $4,949,000
6281078 Manufacturing process to eliminate ONO fence material in high density NAND-type flash memory devices Kent Kuohua Chang, John Jianshi Wang, Ken D. Au 2001-08-28 $6,206,000
6204159 Method of forming select gate to improve reliability and performance for NAND type flash memory devices Kent Kuohua Chang, Kenneth Wo-Wai Au 2001-03-20 $7,513,000
6184084 Method to elimate silicide cracking for nand type flash memory devices by implanting a polish rate improver into the second polysilicon layer and polishing it David Chi, Kent Kuohua Chang 2001-02-06 $6,888,000
6177312 Method for removing contaminate nitrogen from the peripheral gate region of a non-volatile memory device during production of such device John Jianshi Wang, Toru Ishigaki, Kent Kuohua Chang, Effiong Ibok 2001-01-23 $6,489,000
6146795 Method for manufacturing memory devices Jiahua Huang, Kent Kuohua Chang 2000-11-14 $4,365,000
6114230 Nitrogen ion implanted amorphous silicon to produce oxidation resistant and finer grain polysilicon based floating gates Kent Kuohua Chang, David Chi 2000-09-05 $8,144,000
6066873 Method and apparatus for preventing P1 punchthrough John Jianshi Wang, Kent Kuohua Chang 2000-05-23 $12,811,000
6063668 Poly I spacer manufacturing process to eliminate polystringers in high density nand-type flash memory devices Kent Kuohua Chang, John Jianshi Wang 2000-05-16 $14,024,000
6017786 Method for forming a low barrier height oxide layer on a silicon substrate John Jianshi Wang, Dae Yeong Joh 2000-01-25 $8,114,000
5981339 Narrower erase distribution for flash memory by smaller poly grain size Kent Kuohua Chang, David Chi 1999-11-09 $2,369,000
5972749 Method for preventing P1 punchthrough John Jianshi Wang, Kent Kuohua Chang 1999-10-26 $1,975,000