| 6821713 |
Method for lateral trimming of spacers |
Allison Holbrook, Sunny Cherian |
2004-11-23 |
| 6647995 |
Method and system for eliminating post etch residues |
Yue-Song He, Frank Mak |
2003-11-18 |
| 6500768 |
Method for selective removal of ONO layer |
Jeffrey A. Shields, Jean Y. Yang |
2002-12-31 |
| 6495853 |
Self-aligned gate semiconductor |
Allison Holbrook, Sunny Cherian |
2002-12-17 |
| 6383945 |
High selectivity pad etch for thick topside stacks |
Jeffrey A. Shields, Allison Holbrook |
2002-05-07 |
| 6358760 |
Method for amorphous silicon local interconnect etch |
Allison Holbrook, James Chiang, Sunny Cherian |
2002-03-19 |
| 6306707 |
Double layer hard mask process to improve oxide quality for non-volatile flash memory products |
John Foster, Yue-Song He |
2001-10-23 |
| 6297065 |
Method to rework device with faulty metal stack layer |
Pei-Yuan Gao, Anne E. Sanderfer |
2001-10-02 |
| 6153470 |
Floating gate engineering to improve tunnel oxide reliability for flash memory devices |
Yue-Song He, Kent Kuohua Chang |
2000-11-28 |
| 6146795 |
Method for manufacturing memory devices |
Yuesong He, Kent Kuohua Chang |
2000-11-14 |
| 6013156 |
Bubble monitor for semiconductor manufacturing |
Allison Holbrook, Aaron Fernandes |
2000-01-11 |