| 12319900 |
Integral gas-introduction and stirring unit for gas-liquid reactors |
Patrick BONGARTZ, Matthias Wessling |
2025-06-03 |
| 9898572 |
Metal line layout based on line shifting |
Thomas Melde, Matthias Lehr, Thomas Herrmann, Jens Hassmann, Rakesh Kumar Kuncha |
2018-02-20 |
| 9281252 |
Method comprising applying an external mechanical stress to a semiconductor structure and semiconductor processing tool |
Alexander Würfel |
2016-03-08 |
| 8575029 |
Technique for forming metal lines in a semiconductor by adapting the temperature dependence of the line resistance |
Matthias Lehr, Eckhard Langer |
2013-11-05 |
| 8329577 |
Method of forming an alloy in an interconnect structure to increase electromigration resistance |
Matthias Lehr, Eckhard Langer |
2012-12-11 |
| 8058731 |
Technique for forming metal lines in a semiconductor by adapting the temperature dependence of the line resistance |
Matthias Lehr, Eckhard Langer |
2011-11-15 |
| 8058081 |
Method of testing an integrity of a material layer in a semiconductor structure |
Eckhard Langer, Frank Koschinsky |
2011-11-15 |
| 8039395 |
Technique for forming embedded metal lines having increased resistance against stress-induced material transport |
Hans-Juergen Engelmann, Ehrenfried Zschech, Peter Huebler |
2011-10-18 |
| 7718447 |
System and method for estimating the crystallinity of stacked metal lines in microstructures |
Inka Zienert, Hartmut Prinz |
2010-05-18 |
| 7335880 |
Technique for CD measurement on the basis of area fraction determination |
Eckhard Langer |
2008-02-26 |
| 6953755 |
Technique for monitoring the state of metal lines in microstructures |
Ehrenfried Zschech, Eckhard Langer |
2005-10-11 |
