Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › System and method for estimating the crystallinity of stacked metal lines in microstructures

System and method for estimating the crystallinity of stacked metal lines in microstructures

US Patent 7718447 · Granted May 18, 2010

Estimated economic value: $8,134,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Integral gas-introduction and stirring unit for gas-liquid reactors2025
Metal line layout based on line shifting2018
Method comprising applying an external mechanical stress to a semiconductor stru2016
Technique for forming metal lines in a semiconductor by adapting the temperature2013
Method of forming an alloy in an interconnect structure to increase electromigra2012
Method of testing an integrity of a material layer in a semiconductor structure2011
Technique for forming metal lines in a semiconductor by adapting the temperature2011
Technique for forming embedded metal lines having increased resistance against s2011
Method of determining an orientation of a crystal lattice of a first substrate r2008
Technique for CD measurement on the basis of area fraction determination2008
Technique for monitoring the state of metal lines in microstructures2005