Issued Patents All Time
Showing 26–42 of 42 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6130467 | Shallow trench isolation with spacers for improved gate oxide quality | Basab Bandyopadhyay, Nick Kepler, Olov Karlsson, Effiong Ibok, Christopher F. Lyons | 2000-10-10 |
| 6124183 | Shallow trench isolation formation with simplified reverse planarization mask | Olov Karlsson, Christopher F. Lyons, Basab Bandyopadhyay, Nick Kepler, Effiong Ibok | 2000-09-26 |
| 6100145 | Silicidation with silicon buffer layer and silicon spacers | Nick Kepler, Karsten Wieczorek, Paul R. Besser | 2000-08-08 |
| 6096599 | Formation of junctions by diffusion from a doped film into and through a silicide during silicidation | Nick Kepler, Karsten Wieczorek, Paul R. Besser | 2000-08-01 |
| 6090712 | Shallow trench isolation formation with no polish stop | Christopher F. Lyons, Basab Bandyopadhyay, Nick Kepler, Olov Karlsson, Effiong Obok | 2000-07-18 |
| 6090713 | Shallow trench isolation formation with simplified reverse planarization mask | Olov Karlsson, Christopher F. Lyons, Basab Bandyophadhyay, Nick Kepler, Effiong Ibok | 2000-07-18 |
| 6087243 | Method of forming trench isolation with high integrity, ultra thin gate oxide | — | 2000-07-11 |
| 6074927 | Shallow trench isolation formation with trench wall spacer | Nick Kepler, Basab Bandyopadhyay, Olov Karlsson, Effiong Ibok, Christopher F. Lyons | 2000-06-13 |
| 6037671 | Stepper alignment mark structure for maintaining alignment integrity | Nick Kepler, Olov Karlsson, Basab Bandyopadhyay, Effiong Ibok, Christopher F. Lyons | 2000-03-14 |
| 5970362 | Simplified shallow trench isolation formation with no polish stop | Christopher F. Lyons, Basab Bandyopadhyay, Nick Kepler, Olov Karlsson, Effiong Ibok | 1999-10-19 |
| 5970363 | Shallow trench isolation formation with improved trench edge oxide | Nick Kepler, Olov Karlsson, Basab Bandyopadhyay, Effiong Ibok, Christopher F. Lyons | 1999-10-19 |
| 5963816 | Method for making shallow trench marks | Craig S. Sander, Anna M. Minvielle | 1999-10-05 |
| 5930645 | Shallow trench isolation formation with reduced polish stop thickness | Christopher F. Lyons, Basab Bandyopadhyay, Nick Kepler, Olov Karlsson, Effiong Ibok | 1999-07-27 |
| 5926723 | Generation of a loose planarization mask having relaxed boundary conditions for use in shallow trench isolation processes | — | 1999-07-20 |
| 5904543 | Method for formation of offset trench isolation by the use of disposable spacer and trench oxidation | — | 1999-05-18 |
| 5893744 | Method of forming a zero layer mark for alignment in integrated circuit manufacturing process employing shallow trench isolation | — | 1999-04-13 |
| 5485097 | Method of electrically measuring a thin oxide thickness by tunnel voltage | — | 1996-01-16 |