YC

Yahru Cheng

TSMC: 11 patents #274 of 4,162Top 7%
Overall (2024): #7,142 of 561,600Top 2%
11
Patents 2024

Issued Patents 2024

Showing 1–11 of 11 patents

Patent #TitleCo-InventorsDate
12159787 Method of manufacturing a semiconductor device and pattern formation method Chih-Cheng Liu, Ming-Hui Weng, Jr-Hung Li, Chi-Ming Yang, Tze-Liang Lee +1 more 2024-12-03
12135501 Method of manufacturing a semiconductor device Ming-Hui Weng, Chen-Yu Liu, Chih-Cheng Liu, Yi-Chen Kuo, Jia-Lin WEI +5 more 2024-11-05
12106961 Humidity control or aqueous treatment for EUV metallic resist An-Ren Zi, Ching-Yu Chang, Chin-Hsiang Lin 2024-10-01
12094952 Air spacer formation with a spin-on dielectric material Ting-Ting Chen, Chen-Han Wang, Keng-Chu Lin, Shuen-Shin Liang, Tsu-Hsiu Perng +3 more 2024-09-17
12087592 Ambient controlled two-step thermal treatment for spin-on coating layer planarization Chen-Fong Tsai, Ya-Lun CHEN, Tsai-Yu Huang, Huicheng Chang, Yee-Chia Yeo 2024-09-10
12057315 Photoresist layer surface treatment, cap layer, and method of forming photoresist pattern Yi-Chen Kuo, Chih-Cheng Liu, Ming-Hui Weng, Jia-Lin WEI, Yen-Yu Chen +4 more 2024-08-06
12013641 Method of reducing undesired light influence in extreme ultraviolet exposure Chih-Tsung Shih, Chen-Ming Wang, Bo-Tsun Liu, Tsung Chuan Lee 2024-06-18
12002675 Photoresist layer outgassing prevention Yen-Yu Chen, Chih-Cheng Liu, Yi-Chen Kuo, Jr-Hung Li, Tze-Liang Lee +1 more 2024-06-04
11971657 Photoresist developer and method of developing photoresist An-Ren Zi, Chin-Hsiang Lin, Ching-Yu Chang 2024-04-30
11942322 Method of manufacturing semiconductor devices and pattern formation method An-Ren Zi, Chun-Chih HO, Ching-Yu Chang 2024-03-26
11901189 Ambient controlled two-step thermal treatment for spin-on coating layer planarization Chen-Fong Tsai, Ya-Lun CHEN, Tsai-Yu Huang, Huicheng Chang, Yee-Chia Yeo 2024-02-13